阿部 良夫 | Department Of Materials Science Kitami Institute Of Technology
スポンサーリンク
概要
関連著者
-
阿部 良夫
Department Of Materials Science Kitami Institute Of Technology
-
Abe Yuji
Advanced Technology R&d Center Mitsubishi Electric Corporation
-
Abe Y
Mitsubishi Electric Corp. Hyogo Jpn
-
佐々木 克孝
Department Of Materials Science Kitami Institute Of Technology
-
ABE Yoshio
Department of Materials Science, Kitami Institute of Technology
-
SASAKI Katsutaka
Department of Materials Science, Kitami Institute of Technology
-
阿部 良夫
北見工業大学マテリアル工学科
-
佐々木 克孝
北見工業大学
-
Kamijyo Masahiro
Department Of Materials Science Faculty Of Engineering Kitami Institute Of Technology
-
川村 みどり
Department Of Materials Science Kitami Institute Of Technology
-
佐々木 克孝
北見工業大学工学部機能材料工学科
-
阿部 良夫
北見工業大学工学部能材料工学科
-
Abe Yoichi
Department Of Applied Science Tokyo Electrical Engineering College
-
Abe Yoshio
Department Of Materials Science Faculty Of Engineering Kitami Institute Of Technology
-
Sasaki Katsutaka
Department Of Electrical And Electronic Engineering Faculty Of Engineering Kitami Institute Of Techn
-
柳沢 英人
北見工業大学工学部能材料工学科
-
柳沢 英人
北見工業大学
-
Yanagisawa H
Nhk Sci. And Technical Res. Lab. Tokyo Jpn
-
Yanagisawa H
Kitami Inst. Technol. Kitami Jpn
-
SHINKAI Satoko
Department of Materials Science, Faculty of Engineering, Kitami Institute of Technology
-
YANAGISAWA Hideto
Department of Electrical and Electronic Engineering, Faculty of Engineering, Kitami Institute of Tec
-
Tokuda Y
Mitsubishi Electric Corp. Hyogo Jpn
-
Tokuda Yasunori
Advanced Technology R&d Center Mitsubishi Electric Corporation
-
Tokuda Yasunori
Central Research Laboratory Mitsubishi Electric Corporation
-
川村 みどり
北見工業大学工学部機能材料工学科
-
山根 美佐雄
北見工業大学工学部機能材料工学科
-
Shinkai Satoko
Research Fellow Of The Japan Society For The Promotion Of Science
-
Tokuda Yasunori
Advanced R&d Technology Center Mitsubishi Electric Corporation
-
笹木 敬司
北海道大学電子科学研究所
-
KAWAMURA Midori
Department of Materials Science, Kitami Institute of Technology
-
Yanagisawa Hideto
Department Of Electrical And Electronic Engineering Kitami Institute Of Technology
-
Abe Yuji
Advanced R&d Technology Center Mitsubishi Electric Corporation
-
Shinkai S
Department Of Materials Science Faculty Of Engineering Kitami Institute Of Technology
-
Shinkai Satoko
Department Of Materials Science Faculty Of Engineering Kitami Institute Of Technology
-
OISHI Toshiyuki
Advanced Technology R&D Center, Mitsubishi Electric Corporation
-
Oishi Toshiyuki
Information Technology R&d Center Mitsubishi Electric Corporation
-
Kawamura Midori
Department Of Materials Science Faculty Of Engineering Kitami Institute Of Technology
-
Shiozawa K
Advanced Technology R&d Center Mitsubishi Electric Corporation
-
Sugihara Kazuyoshi
Process & Manufacturing Engineering Center Semiconductor Company Toshiba Corp.
-
Sasaki K
Advanced Technology R&d Center Mitsubishi Electric Corporation
-
新海 聡子
詫間電波高専
-
Sasaki Kimihiro
Graduate School Of Natural Science And Technology Kanazawa University
-
Sasaki Koh
Institute For Materials Research Tohoku University
-
野矢 厚
北見工業大学工学部電気電子工学科
-
SHIOZAWA Katsuomi
Advanced Technology R&D Center, Mitsubishi Electric Corporation
-
Shiozawa Katsuomi
Advanced Technology R&d Center Mitsubishi Electric Corporation
-
MARUNO Shigemitsu
Advanced Technology R&D Center, Mitsubishi Electric Corporation
-
Furukawa T
Sci. Univ. Tokyo Tokyo Jpn
-
NAKAHATA Takumi
Advanced Technology R&D Center, Mitsubishi Electric Corporation
-
FURUKAWA Taisuke
Advanced Technology R&D Center, Mitsubishi Electric Corporation
-
FURUKAWA Akihiko
Advanced Technology R&D Center, Mitsubishi Electric Corporation
-
Miura Naruhisa
Advanced Technology R&d Center Mitsubishi Electric Corporation
-
SUGIHARA Kohei
Advanced Technology R&D Center, Mitsubishi Electric Corporation
-
Sugihara Kohei
Process & Manufacturing Engineering Center Semiconductor Company Toshiba Corp.
-
Nanjo Takuma
Advanced Technology R&d Center Mitsubishi Electric Corporation
-
Maruno S
Advanced Technology R&d Center Mitsubishi Electric Corporation
-
Sugihara Kohei
Advanced Technology R&d Center Mitsubishi Electric Corporation
-
Maruno Shigemitsu
Advanced Technology R&d Center Mitsubishi Electric Corporation
-
Furukawa A
Advanced Technology R&d Center Mitsubishi Electric Corporation
-
Furukawa Akihiko
Advanced Technology R & D Center Mitsubishi Electric Corporation
-
大石 直也
北見工業大学工学部機能材料工学科 : (現)大倉電気株式会社
-
尾関 雅彦
松尾電機株式会社
-
KIMURA Kozo
Optoelectronics Joint Research Laboratory
-
Miyake H
Kitami Inst. Technol. Kitami Jpn
-
Miyake Hidekazu
Pharmacobioregulation Research Laboratory Taiho Pharmaceutical Co. Ltd.
-
Kanamoto K
Mitsubishi Electric Corp. Hyogo Jpn
-
Kanamoto Kyozo
Femtosecond Technology Research Association (festa)
-
KATO Kiyohiko
Department of Materials Science, Faculty of Engineering, Kitami Institute of Technology
-
KAMIJYO Masahiro
Department of Materials Science, Faculty of Engineering, Kitami Institute of Technology
-
YAMANE Misao
Department of Materials Science, Faculty of Engineering, Kitami Institute of Technology
-
KAGA Yukinao
Department of Materials Science, .Faculty of Engineering, Kitami Institute of Technology
-
SUITA Muneyoshi
Advanced Technology R&D Center, Mitsubishi Electric Corporation
-
MIYAKE Hidekazu
Department of Materials Science, Faculty of Engineering, Kitami Institute of Technology
-
Miyake Hidekazu
Department Of Materials Science Faculty Of Engineering Kitami Institute Of Technology
-
MARUNO Shigemitsu
The Institute of Scientific and Industrial Research, Osaka University
-
Nakahata T
Mitsubishi Electric Corp. Hyogo Jpn
-
Miura N
Advanced Technology R&d Center Mitsubishi Electric Corporation
-
Kaga Yukinao
Department Of Materials Science .faculty Of Engineering Kitami Institute Of Technology
-
NANJO Takuma
Advanced Technology R&D Center, Mitsubishi Electric Corporation
-
新海 聡子
北見工業大学 工学部 機能材料工学科
-
HARIMA Hiroshi
Department of Electronics and Information Science, Kyoto Institute of Technology
-
Abe Hajime
Department of Cardiology, Sakakibara Heart Institute
-
渡辺 大輔
東京工業高等専門学校専攻科
-
渡邊 大介
東京工業高等専門学校専攻科
-
Miura N
Department Of Materials Science And Technology Graduate School Of Engineering Sciences Kyushu Univer
-
新海 聡子
日本学術振興会特別研究員(PD)
-
田邉 彩
北見工業大学工学部機能材料工学科
-
Abe Hajime
Department Of Applied Physics Graduate School Of Engineering Osaka University
-
NAKASHIMA Shin-ichi
Department of Applied Physics,Osaka University
-
野矢 厚
北見工業大学電気電子工学科
-
Aoyagi Yoshinobu
Nanoscience Development And Support Team Riken
-
ONOZUKA Tomotake
Department of Materials Science, Faculty of Engineering, Kitami Institute of Technology
-
後藤 智利
北見工業大学工学部機能材料工学科
-
Yamane Misao
Department Of Materials Science Faculty Of Engineering Kitami Institute Of Technology
-
尾関 雅彦
北見工業大学
-
Onozuka Tomotake
Department Of Materials Science Faculty Of Engineering Kitami Institute Of Technology
-
Sakai Kiyomi
Kansai Advanced Research Center Communications Research Laboratory The Ministry Of Posts And Telecom
-
Abe H
Semiconductor Technology Development Group Semiconductor Solutions Network Company Sony Corporation
-
Sakai K
宮崎大
-
Harima H
Department Of Electronics And Information Science Kyoto Institute Of Technology
-
Harima Hiroshi
Department Of Applied Physics Osaha University
-
Yamane M
Tokyo Inst. Technol. Tokyo Jpn
-
Takeuchi Misaichi
Nanoscience Development And Support Team Riken
-
Kato K
Department Of Materials Science Faculty Of Engineering Kitami Institute Of Technology
-
Suita Muneyoshi
Advanced Technology R&d Center Mitsubishi Electric Corporation
-
Tsukada N
Aomori Univ. Aomori Jpn
-
Nakashima S
Ntt Telecommunications Energy Lab. Atsugi Jpn
-
Nakashima Shin-ichi
Department Of Applied Physics Faculty Of Engineering Osaka University
-
Kato Kazumi
National Institute Of Advanced Industrial Science And Technology
-
SAKAI Akira
Department of Crystalline Materials Science, Graduate School of Engineering, Nagoya University
-
ZAIMA Shigeaki
Department of Crystalline Materials Science, Graduate School of Engineering, Nagoya University
-
YOSHIDA Naoto
Department of Biochemistry and Applied Biosciences, Faculty of Agriculture, Miyazaki University
-
EGAWA Takashi
Research center for Nano-Device and System, Nagoya Institute of Technology
-
ISHIKAWA Takeshi
Department of Pediatrics, Iwate Medical College
-
ISHIKAWA Hiroyasu
Research Center for Nano-Device and System, Nagaya Institute of Technology
-
三宅 秀和
北見工業大学工学部能材料工学科
-
鈴木 崇司
北見工業大学工学部機能材料工学科
-
Yoshida Naoto
Department Of Biochemistry And Applied Biosciences Faculty Of Agriculture Miyazaki University
-
Kanamoto Kyozo
Central Research Laboratory Mitsubishi Electric Corporation
-
Kanamoto Kyozo
Advanced Technology R&d Center Mitsubishi Electric Corporation
-
ONISAWA Ken-ichi
Hitachi Research Laboratory, Hitachi, Ltd.
-
HANGYO Masanori
Research Center for Superconducting Materials and Electronics, Osaka University
-
TAKEUCHI Misaichi
Nanoscience Development and Support Team, RIKEN
-
ITADANI Naruhiro
Department of Materials Science, Kitami Institute of Technology
-
ITOH Hidenobu
Department of Materials Science, Kitami Institute of Technology
-
茶畑 嘉仁
北見工業大学
-
MIREBA Kazuhiro
Department of Materials Science, Faculty of Engineering, Kitami Institute of Technology
-
IIBUCHI Kyouhei
Department of Materials Science, Kitami Institute of Technology
-
YAN Jiwang
Department of Mechanical Engineering, Faculty of Engineering, Kitami Institute of Technology
-
MAEKAWA Kouki
Department of Mechanical Engineering, Faculty of Engineering, Kitami Institute of Technology
-
SHIOJIRI Masayuki
Department of Materials Science, Faculty of Engineering, Kitami Institute of Technology
-
渡邊 大介
北見工業大学工学部機能材料工学科
-
渡辺 大輔
北見工業大学工学部機能材料工学科
-
OZEKI Tatsuo
Advanced Technology R&D Center, Mitsubishi Electric Corporation
-
YAMAKAWA Satoshi
Advanced Technology R&D Center, Mitsubishi Electric Corporation
-
ABE Yuji
Central Research Laboratory, Mitsubishi Electric Corporation
-
伊藤 ひろみ
北見工業大学工学部機能材料工学科
-
TSUKADA Noriaki
Central Research Laboratory, Mitsubishi Electric Corporation
-
TANI Masahiko
Kansai Advanced Research Center, National Institute of Information and Communications Technology
-
SAKAI Kiyomi
Kansai Advanced Research Center, National Institute of Information and Communications Technology
-
YAGYU Eiji
Advanced Technology R&D Center, Mitsubishi Electric Corporation
-
YOSHIARA Kiichi
Advanced Technology R&D Center, Mitsubishi Electric Corporation
-
Yoshiara Kiichi
Advanced Technology R&d Center Mitsubishi Electric Corporation
-
Yoshiara Kiichi
Advanced Technology R&d Center Mitsubishi Electric Corp.
-
Sakai Kiyomi
Kansai Advanced Research Center Communication Research Laboratory
-
TANI Masahiko
Communications Research Laboratory, Kansai Advanced Research Center
-
SAKAI Kiyomi
Communications Research Laboratory, Kansai Advanced Research Center
-
TOKUDA Yasunori
Semiconductor Research Laboratory, MITSUBISHI Electric Corporation
-
KANAMOTO Kyozo
Semiconductor Research Laboratory, MITSUBISHI Electric Corporation
-
ABE Yuji
Semiconductor Research Laboratory, MITSUBISHI Electric Corporation
-
TSUKADA Noriaki
Semiconductor Research Laboratory, MITSUBISHI Electric Corporation
-
Ishikawa Hiroyasu
Research Center For Nano-device And System Nagoya Institute Of Technology
-
Inoue A
Microwave Device Development Department Mitsubishi Electric Corporation
-
Tani Masahiko
Kansai Advanced Research Center Communication Research Laboratory
-
NAKATSUKA Shigenori
Microwave Device Development Department, Mitsubishi Electric Corporation
-
INOUE Akira
Microwave Device Development Department, Mitsubishi Electric Corporation
-
ISHIKAWA Takahide
Microwave Device Development Department, Mitsubishi Electric Corporation
-
MATSUDA Yoshio
Microwave Device Development Department, Mitsubishi Electric Corporation
-
NISHIOKA Yasutaka
Advanced Technology R&D Center, Mitsubishi Electric Corporation
-
Nakatsuka Shigenori
Microwave Device Development Department Mitsubishi Electric Corporation
-
OISHI Toshiyuki
Information Technology R&D Center, Mitsubishi Electric Corporation
-
NANJO Takuma
Mitsubishi Electric Corporation, Advanced Technology Research & Development Center
-
TAKEUCHI Misaichi
RIKEN, Nanoscience Development and Support Team
-
SUITA Muneyoshi
Mitsubishi Electric Corporation, Advanced Technology Research & Development Center
-
ABE Yuji
Mitsubishi Electric Corporation, Advanced Technology Research & Development Center
-
OISHI Toshiyuki
Mitsubishi Electric Corporation, Advanced Technology Research & Development Center
-
TOKUDA Yasunori
Mitsubishi Electric Corporation, Advanced Technology Research & Development Center
-
AOYAGI Yoshinobu
Tokyo Institute of Technology, Dept. of Electronics and Applied Physics
-
Hangyo M
Research Center For Superconductor Photonics Osaka University
-
Hangyo Masanori
Research Center For Superconducting Materials And Electronics Osaka University
-
Hangyo Masanori
Department Of Applied Physics Osaka University
-
Hangyo Masanori
Department Of Physics Faculty Of Science Kyoto University
-
Nishioka Yasutaka
Advanced Technology R&d Center Mitsubishi Electric Corporation
-
北田 泰裕
北見工業大学工学部機能材料工学科
-
稲田 晴久
北見工業大学工学部機能材料工学科
-
加我 友紀直
北見工業大学工学部機能材料工学科
-
Mireba Kazuhiro
Department Of Materials Science Faculty Of Engineering Kitami Institute Of Technology
-
Suita Muneyoshi
Advanced Technology R&d Center Mitsubishi Electric Corp.
-
Yagyu Eiji
Advanced Technology R&d Center Mitsubishi Electric Corporation
-
ABE Yoshio
Hitachi Research Laboratory, Hitachi, Ltd.
-
Tsukada Noriaki
Central Research Lab. Mitsubishi Electric Corp.
-
Hanazono Masanobu
Hitachi Research Laboratory Hitachi Ltd.
-
加藤 清彦
北見工業大学工学部機能材料工学科
-
山本 千晴
北見工業大学工学部機能材料工学科
-
山本 明典
北見工業大学工学部機能材料工学科
-
驚頭 永輔
北見工業大学工学部機能材料工学科
-
Aoyagi Yoshinobu
Tokyo Institute Of Technology Dept. Of Electronics And Applied Physics
-
Ishikawa Takeshi
Department Of Food And Nutritional Sciences And Global Center Of Excellence (coe) Program University
-
NAKAYAMA Takahiro
Hitachi Research Laboratory, Hitachi, Ltd.
-
Onisawa K
Hitachi Research Laboratory Hitachi Ltd.
-
Onisawa Ken-ichi
Hitachi Research Laboratory Hitachi Ltd.
-
Yamakawa Shinya
Advanced Technology R&d Center Mitsubishi Electric Corporation
-
Yoshida Naoto
Department Of Applied Biology Faculty Of Textile Science And Technology Shinshu University
-
Yoshida Naoto
Department Of Materials Science Faculty Of Engineering Kitami Institute Of Technology
-
Abe Yoshio
Hitachi Research Laboratory Hitachi Ltd.
-
Takeuchi Misaichi
Riken Nanoscience Development And Support Team
-
Ishikawa Takeshi
Department Of Chemistry And Materials Engineering Faculty Of Chemistry Materials And Bioengineering
-
Ishikawa Takeshi
Department Of Materials Science Kitami Institute Of Technology
-
稲田 晴久
北見工業大学工学部機能材料工学科:(現)富士通東北海道システムエンジニアリング
-
Nakayama Takahiro
Hitachi Research Laboratory Hitachi Ltd.
著作論文
- C-6-3 化学量論的なTaN薄膜の(100)Si上での室温エピタキシャル成長(C-6.電子部品・材料,エレクトロニクス2)
- Ta-Zr合金による陽極酸化膜キャパシタの電気的特性に及ぼす熱処理温度と酸化膜厚低減の影響
- C-6-8 Ta-Zr合金による熱的に安定な高誘電率陽極酸化膜キャパシタの作製
- Al_3Ta陽極酸化膜キャパシタの作製とその耐熱性
- CPM2000-90 NbドープSrTiO_3薄膜の膜質に及ぼすMgO基板表面処理とポストアニールの影響
- CPM2000-83 薄いZrN/Zr2層膜を介在させたAl/ZrN/Zr/Siコンタクト系の熱的安定性
- CPM2000-76 導電性RhO2薄膜の電気特性に及ぼす熱処理の影響
- CPM2000-72 WOx薄膜の形成過程とその電気及び光学特性
- Preparation of Hydrogen-Containing Ta_2O_5 Thin Films by Reactive Sputtering Using O_2 + H_2O Mixed Gas
- Effect of Substrate Temperature on Epitaxial Orientation of Rh Thin Films Sputtered on A-Plane Sapphire
- Control of Epitaxial Growth Plane of Rh Thin Films on A-Plane Sapphire by Sputter Deposition
- Oxidation and Morphology Change of Ru Films Caused by Sputter Deposition of Ta_2O_5 Films
- Effects of Sputtering Parameters on the Formation of Single-Oriented (002) Ti Film on Si
- Epitaxial Growth of (001)ZrN Thin Films on (001)Si by Low Temperature Process
- Epitaxial Growth of (001)Rh Thin Film on (001)MgO Single-Crystal Substrate by Sputtering
- Difference in Thermal Degradation Behavior of ZrO_2 and HfO_2 Anodized Capacitors
- Crystal Orientation Change of Ni Films by Sputtering in Ar-N_2 Mixed Gases
- Improvement of the Crystal Orientation and Surface Roughness of Ru Thin Films by Introducing Oxygen during Sputtering
- Realization of Sequential Epitaxial Growth of Cu/HfN Bilayered Films on (111) and (001) Si
- Epitaxial Ir Thin Film on (001) MgO Single Crystal Prepared by Sputtering
- Preparation of Low-Resistivity α-Ta Thin Films on (001) Si by Conventional DC Magnetron Sputtering
- Capacitor Property and Leakage Current Mechanism of ZrO_2 Thin Dielectric Films Prepared by Anodic Oxidation
- Highly Texrured (100) RuO_2/(001) Ru Multilayers Preparedly by Sputtering
- Electrical Properties of HfO_2 Thin Insulating Film Prepared by Anodic Oxidation
- C-Axis-Oriented Ru Thin Fillns Prepared by Sputtering in Ar and O_2 Gas Mixture : Surfaces, Interfaces, and Films
- 超高真空系で作製したMo/(100)Si系のシリサイド形成初期過程
- Alメタライゼーション系におけるAl_12Mo/Mo積層膜の拡散バリヤ効果
- (200)TiN高配向膜上への(111)Al高配向成長に及ぼすAl_3Ti中間介在層の影響
- Realization of Cu(111) Single-Oriented State on SiO_2 by Annealing Cu-Zr Film and the Thermal Stability of Cu-Zr/ZrN/Zr/Si Contact System
- Single-Oriented Growth of(111)Cu Film on Thin ZrN/Zr Bilayered Film for ULSI Metallization
- Study on Preparation Conditions of Single-Oriented(002)Zr Thin Films on n-(001)Si
- 低化成電圧で作製したAl_3Hf陽極酸化膜キャパシタの熱劣化機構
- Al_3Hf金属間化合物の陽極酸化膜による高耐熱, 高信頼性薄膜キャパシタの検討
- Al_3Hf陽極酸化膜キャパシタの電気的特性と耐熱特性
- Drivability Enhancement for AlGaN/GaN High-Electron Mobility Transistors with AlN Spacer Layer Using Si Ion Implantation Doping
- First Operation of AlGaN Channel High Electron Mobility Transistors
- First Operation of AlGaN Channel High Electron Mobility Transistors with Sufficiently Low Resistive Source/Drain Contact formed by Si Ion Implantation
- Improvement of DC and RF Characteristics of AlGaN/GaN High Electron Mobility Transistors by Thermally Annealed Ni/Pt/Au Schottky Gate
- Characterization of Crystallinity in Low-Temperature-Grown GaAs Layers by Raman Scattering and Time-Resolved Photoreflectance Measurements
- Spectroscopic Characterization of Low-Temperature Grown GaAs Epitaxial Films
- A Dual-Gate Complementary Metal-Oxide-Semiconductor Technology with Novel Self-Aligned Pocket Implantation which Takes Advantage of Elevated Source/Drain Configurations
- Self-Aligned Pocket Implantation into Elevated Source/Drain MOSFETs for Reduction of Junction Capacitance and Leakage Current
- Parasitic Resistance Reduction in Deep Submicron Dual-Gate Transistors with Partially Elevated Source/Drain Extension Regions Fabricated by Complementary Metal-Oxide-Semiconductor Technologies
- Advantage of Shallow Trench Isolation over Local Oxidation of Silicon on Alignment Tolerance
- Noticeable Enhancement of Edge Effect in Short Channel Characteristics of Trench-Isolated MOSFETs
- Anomalous Gate Length Dependence of Threshold Voltage of Trench-Isolated Metal Oxide Semiconductor Field Effect Transistors
- Narrow-Channel Metal Oxide Semiconductor Field Effect Transistor (MOSFET)Isolated by an Ultra-Fine Trench
- Room-Temperature Self-Electrooptic Effects of GaAs/AlAs Asymmetric Coupled Quantum Wells
- CPM2000-82 (001)Si上(111)Cu/(111)HfN/(002)Hf三層膜の連続単配向成長に及ぼすHf膜厚の影響
- Al_3Zr金属間化合物膜の陽極酸化とそれを応用した高信頼性薄膜キャパシタの作製
- Alメタライゼーション系へのAl_3Hf/Hf積層膜の拡散バリヤとしての適用
- Al_3Hf金属間化合物膜の結晶化過程と電気的特性
- n-(001)Si上への単配向Hf膜の作製条件の検討
- 反応性スパッタリング法によるRuO_2薄膜の作製とその電気特性
- Al-Si間におけるAl_3Zr/Zr積層膜の拡散バリヤ効果について
- Study on Preparation Conditions of High-Quality ZrN Thin Films Using a Low-Temperature Process
- Preparation of Oxygern-Containing Pt and Pt Oxide Thin Films by Reactive Sputtering and Their Characterization
- Formation Process and Electrical Property of RuO_2 Thin Films Prepared by Reactive Sputtering
- Initial Silicide Formation Process of Single Oriented (002) Hf Film on Si and Its Diffusion Barrier Property
- A Study on the Preparation Conditions of Single Oriented (002) Hf Film on n-(001) Si
- Surface Oxidation Behavior of TiN Film Caused by Depositing SrTiO_3 Film
- Application of Al_3Hf/Hf Bilayered Film as a Diffusion Barrier to Al Metallization System of Si Large-Scale Integration
- Preparation of RhO2 Thin Films by Reactive Sputtering and Their Characterizations
- Electrical Properties of Amorphous Rh Oxide Thin Films Prepared by Reactive Sputtering
- Thermal Stability of RuO_2 Thin Films and Effects of Annealing Ambient on Their Reduction Process
- Preparation of PtO and α-PtO_2 Thin Films by Reactive Sputtering and Their Electrical Properties
- 低化成電圧で作製したTa_2N陽極酸化膜キャパシタの耐熱特性
- 低化成電圧で作製したTa_2N陽極酸化膜キャパシタの熱安定性
- A Chemical Mechanism for Determining the Influence of Boron on Silicon Epltaxial Growth : Semiconductors
- CPM2000-71 Ta窒化物のTa-Al化合物膜への代替による薄膜キャパシタの容量低減の抑制効果
- Ta_2N陽極酸化膜キャパシタの耐熱要因と薄膜化の検討
- Ta_2N 陽極酸化膜キャパシタの耐熱性と酸化膜厚
- Effects of Substrate Temperature during Phosphor Layer Deposition on Luminance of SrS:Ce Blue-Green-Emitting Thin-Film Electroluminescent Devices