Preparation of RhO2 Thin Films by Reactive Sputtering and Their Characterizations
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概要
- 論文の詳細を見る
Thin films of RhO2, which belongs to the family of conducting platinum group metal oxides, were prepared by reactive sputtering. Influences of sputtering parameters, such as rf power and substrate temperature, and postdeposition annealing on crystallinity, chemical bonding state and resistivity of the deposited films were studied, in order to obtain low-resistivity RhO2 thin films. The resistivity of the deposited films decreased with decreasing rf power. Plasma emission measurement suggested that oxidation of Rh proceeded under the low rf power condition. Poorly-crystallized conducting RhO2 thin films with resistivity of 300–500 $\mu\Omega$cm were prepared at substrate temperatures below 150°C; the resistivity of the films increased with increasing substrate temperature above 150°C due to the formation of semiconducting Rh2O3. After postdeposition annealing in oxygen atmosphere at up to 700°C, well-crystallized RhO2 films were formed, and the minimum resistivity of 80 $\mu\Omega$cm was obtained.
- Publication Office, Japanese Journal of Applied Physics, Faculty of Science, University of Tokyoの論文
- 2001-04-15
著者
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阿部 良夫
Department Of Materials Science Kitami Institute Of Technology
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Abe Yuji
Advanced Technology R&d Center Mitsubishi Electric Corporation
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Abe Y
Mitsubishi Electric Corp. Hyogo Jpn
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ABE Yoshio
Department of Materials Science, Kitami Institute of Technology
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KAWAMURA Midori
Department of Materials Science, Kitami Institute of Technology
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SASAKI Katsutaka
Department of Materials Science, Kitami Institute of Technology
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KATO Kiyohiko
Department of Materials Science, Faculty of Engineering, Kitami Institute of Technology
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Kamijyo Masahiro
Department Of Materials Science Faculty Of Engineering Kitami Institute Of Technology
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Abe Yoshio
Department Of Materials Science Faculty Of Engineering Kitami Institute Of Technology
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川村 みどり
Department Of Materials Science Kitami Institute Of Technology
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Sasaki Katsutaka
Department Of Electrical And Electronic Engineering Faculty Of Engineering Kitami Institute Of Techn
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Kawamura Midori
Department Of Materials Science Faculty Of Engineering Kitami Institute Of Technology
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Kato K
Department Of Materials Science Faculty Of Engineering Kitami Institute Of Technology
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Kato Kazumi
National Institute Of Advanced Industrial Science And Technology
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Abe Yoshio
Department of Materials Science and Engineering, Faculty of Engineering, Kitami Institute of Technology, 165 Koen-cho, Kitami, Hokkaido 090-8507, Japan
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Kawamura Midori
Department of Materials Science and Engineering, Kitami Institute of Technology, Kitami, Hokkaido 090-8507, Japan
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