Improvement of the Crystal Orientation and Surface Roughness of Ru Thin Films by Introducing Oxygen during Sputtering
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概要
- 論文の詳細を見る
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2004-01-15
著者
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佐々木 克孝
Department Of Materials Science Kitami Institute Of Technology
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阿部 良夫
Department Of Materials Science Kitami Institute Of Technology
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ABE Yoshio
Department of Materials Science, Kitami Institute of Technology
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SASAKI Katsutaka
Department of Materials Science, Kitami Institute of Technology
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SHINKAI Satoko
Department of Materials Science, Faculty of Engineering, Kitami Institute of Technology
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YAN Jiwang
Department of Mechanical Engineering, Faculty of Engineering, Kitami Institute of Technology
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MAEKAWA Kouki
Department of Mechanical Engineering, Faculty of Engineering, Kitami Institute of Technology
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