Formation Process and Electrical Property of RuO_2 Thin Films Prepared by Reactive Sputtering

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概要

• 論文の詳細を見る
• Publication Office, Japanese Journal of Applied Physics, Faculty of Science, University of Tokyoの論文
• 1998-06-01

著者

• 阿部 良夫

  Department Of Materials Science Kitami Institute Of Technology

• Yanagisawa H

  Nhk Sci. And Technical Res. Lab. Tokyo Jpn

• Yanagisawa H

  Kitami Inst. Technol. Kitami Jpn

• Abe Yuji

  Advanced Technology R&d Center Mitsubishi Electric Corporation

• Abe Y

  Mitsubishi Electric Corp. Hyogo Jpn

• ABE Yoshio

  Department of Materials Science, Kitami Institute of Technology

• SASAKI Katsutaka

  Department of Materials Science, Kitami Institute of Technology

• YANAGISAWA Hideto

  Department of Electrical and Electronic Engineering, Faculty of Engineering, Kitami Institute of Tec

• KAGA Yukinao

  Department of Materials Science, .Faculty of Engineering, Kitami Institute of Technology

• Abe Yoshio

  Department Of Materials Science Faculty Of Engineering Kitami Institute Of Technology

• Kaga Yukinao

  Department Of Materials Science .faculty Of Engineering Kitami Institute Of Technology

• Sasaki Katsutaka

  Department Of Electrical And Electronic Engineering Faculty Of Engineering Kitami Institute Of Techn

• Yanagisawa Hideto

  Department Of Electrical And Electronic Engineering Kitami Institute Of Technology

• Abe Yoshio

  Department of Materials Science and Engineering, Faculty of Engineering, Kitami Institute of Technology, 165 Koen-cho, Kitami, Hokkaido 090-8507, Japan

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