Effects of Oxygen in CaS:Eu Active Layers on Emission Properties of Thin Film Electroluminescent Cells
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概要
- 論文の詳細を見る
CaS:Eu active layers for thin film electroluminescent (TFEL) cells were deposited by the electron beam evaporation method under several partial pressures of oxygen, and the effects of oxygen in CaS:Eu active layers on EL characteristics were studied. With increased deposition pressure, the amount of oxygen in the CaS:Eu thin films increased. The EL efficiency and PL intensity due to Eu^<2+> ions decreased, and absorption intensity due to Eu^<2+> ions decreased. In addition, Eu^<3+> emission peaks were observed in the EL spectrum of the cell prepared at a higher deposition pressure (3×10^<-2> Pa). From these results, it was concluded that oxidation of Eu ions (Eu^<2+>→Eu^<3+>) occurred and the concentration of Eu^<2+> ions decreased by adding oxygen during active layer deposition.
- 社団法人応用物理学会の論文
- 1990-08-20
著者
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ONISAWA Ken-ichi
Hitachi Research Laboratory, Hitachi, Ltd.
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Abe Yuji
Advanced Technology R&d Center Mitsubishi Electric Corporation
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Abe Y
Mitsubishi Electric Corp. Hyogo Jpn
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Ono Yoshimasa
Hitachi Research Laboratory Hitachi Ltd.
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ABE Yoshio
Hitachi Research Laboratory, Hitachi, Ltd.
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Hanazono Masanobu
Hitachi Research Laboratory Hitachi Ltd.
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Onisawa K
Hitachi Research Laboratory Hitachi Ltd.
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Onisawa Ken-ichi
Hitachi Research Laboratory Hitachi Ltd.
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Abe Yoshio
Hitachi Research Laboratory Hitachi Ltd.
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