Structural Change during Annealing of Amorphous Indium-Tin Oxide Films Deposited by Sputtering with H_2O Addition
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1996-05-15
著者
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ONISAWA Ken-ichi
Hitachi Research Laboratory, Hitachi, Ltd.
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MINEMURA Tetsuroh
Hitachi Research Laboratory, Hitachi, Ltd.
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Ando Masahiko
Hitachi Research Laboratory Hitachi Ltd.
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Nishimura Etsuko
Hitachi Research Laboratory Hitachi Ltd.
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Minemura Tetsuroh
Hitachi Research Laboratory Hitachi Ltd.
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TAKABATAKE Masaru
Hitachi Research Laboratory, Hitachi, Ltd.
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Takabatake Masaru
Hitachi Research Laboratory Hitachi Ltd.:(present Address) Electron Tube And Devices Division Hitach
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Takabatake Masaru
Hitachi Research Laboratory Hitachi Ltd.
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Onisawa Ken-ichi
Hitachi Research Laboratory Hitachi Ltd.
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Ando Masahiko
Hitachi Cambridge Laboratory, Hitachi, Ltd., J.J. Thomson Avenue, Madingley Road, Cambridge CB3 0HE, U.K.
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