Crystalline Fraction of Microcrystalline Silicon Films Prepared by Plasma-Enhanced Chemical Vapor Deposition Using Pulsed Silane Flow
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1993-11-15
著者
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Minemura T
Hitachi Ltd. Ibaraki Jpn
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KANEKO Toshiki
Hitachi Research Laboratory, Hitachi, Ltd.
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ONISAWA Ken-ichi
Hitachi Research Laboratory, Hitachi, Ltd.
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WAKAGI Masatoshi
Hitachi Research Laboratory, Hitachi, Ltd.
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KITA Yoshiaki
Hitachi Research Laboratory, Hitachi, Ltd.
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MINEMURA Tetsuroh
Hitachi Research Laboratory, Hitachi, Ltd.
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Kasai Yuhki
Graduate School Of Natural Science And Technology Kanazawa University
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Kita Yoshiaki
Hitachi Research Laboratory Hitachi Ltd.
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Kasai Yuuki
Graduate School Of Natural Science And Technology Kanazawa University
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Minemura Tetsuroh
Hitachi Research Laboratory Hitachi Ltd.
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Wakagi M
Hitachi Ltd. Ibaraki Jpn
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Wakagi Masatoshi
Hitachi Research Laboratory Hitachi Ltd.
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Kaneko Toshiki
Hitachi Research Laboratory Hitachi Ltd.
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Kita Yutaro
Graduate School Of Natural Science And Technology Kanazawa University
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Onisawa K
Hitachi Research Laboratory Hitachi Ltd.
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Onisawa Ken-ichi
Hitachi Research Laboratory Hitachi Ltd.
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- Crystalline Fraction of Microcrystalline Silicon Films Prepared by Plasma-Enhanced Chemical Vapor Deposition Using Pulsed Silane Flow
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