Accurate Determination of the Urbach Energy of a-Si:H Thin Films by Correction for the Interference Effect
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1994-12-15
著者
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Leblanc Francois
Hitachi Research Laboratory Hitachi Ltd.
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Ando Masami
Photon Factory National Laboratory For High Energy Physics (kek)
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Minemura T
Hitachi Ltd. Ibaraki Jpn
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WAKAGI Masatoshi
Hitachi Research Laboratory, Hitachi, Ltd.
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MINEMURA Tetsuroh
Hitachi Research Laboratory, Hitachi, Ltd.
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Maksimenko Anton
Photon Factory Imss Kek
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MAEDA Yoshihito
Hitachi Research Laboratory, Hitachi Ltd.
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Maeda Y
Deparment Of Information And Control Engineering Toyota Technological Institute
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Ando Masahiko
Hitachi Research Laboratory Hitachi Ltd.
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Maeda Y
Center For Microelectronic Systems Kyushu Institute Of Technology
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Maeda Y
The Institute Of Scientific And Industrial Research Osaka University
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Minemura Tetsuroh
Hitachi Research Laboratory Hitachi Ltd.
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Wakagi M
Hitachi Ltd. Ibaraki Jpn
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Wakagi Masatoshi
Hitachi Research Laboratory Hitachi Ltd.
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Maeda Yoshihito
Hitachi Research Laboratory Hitachi Ltd.
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Maeda Yukio
Department Of Applied Physics Tokyo University Of Agriculture And Technology
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Ando Masahiko
Hitachi Cambridge Laboratory, Hitachi, Ltd., J.J. Thomson Avenue, Madingley Road, Cambridge CB3 0HE, U.K.
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