Ge K-Edge Extended X-Ray Absorption Fine Structure Study of the Local Structure of Amorphous GeTe and the Crystallization

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1991-01-15

著者

• WAKAGI Masatoshi

  Hitachi Research Laboratory, Hitachi, Ltd.

• MAEDA Yoshihito

  Hitachi Research Laboratory, Hitachi Ltd.

• Wakagi Masatoshi

  Hitachi Research Laboratory Hitachi Ltd.

• Maeda Yoshihito

  Hitachi Research Laboratory Hitachi Ltd.

関連論文

• Crystalline Fraction of Microcrystalline Silicon Films Prepared by Plasma-Enhanced Chemical Vapor Deposition Using Pulsed Silane Flow
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• Dynamics of Rapid Phase Transformations in Amorphous GeTe Induced by Nanosecond Laser Pulses
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• In Situ Optical Measurement Using Optical Fibers for a-Si:H Ultra-Thin Films: Theoretical and Numerical Analysis
• Single-Beam Overwrite with a New Erase Mode of In_3 SbTe_2 Phase-Change Optical Disks : Media
• Single-Beam Overwrite with a New Erase Mode of In_3SbTe_2 Phase-Change Optical Disks
• Disk Structure for High Performance Overwritable Phase-Change Optical Disks : PHASE CHANGE MEDIA I
• Nanocrystalline Silicon Flim Prepared by Laser Annealing of Organosilicon Nanocluster : Semiconductors
• Preparation of Nanometer-Size Crystalline Ge by Chemical Sol-Gel Method and Its Visible Photoluminescence
• Ge K-Edge Extended X-Ray Absorption Fine Structure Study of the Local Structure of Amorphous GeTe and the Crystallization
• Effects of Back-Channel Etching on the Performance of a-Si:H Thin-Film Transistors
• Structural Study of Amorphous SiGe Alloy Films Using Extended X-Ray Absorption Fine Structure
• Structural Study of Amorphous Ge Using Extended X-Ray Absorption Fine Structure
• Thermo-Photometric Study on Phase Transitions in Sputter-Deposited Ag-Zn Alloy Thin Films

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