Structural Study of Amorphous Ge Using Extended X-Ray Absorption Fine Structure
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概要
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Extended X-ray absorption fine structure measurements were made on amorphousgermanium, a-Ge, and hydrogenated amorphous germanium, a-Ge:H, both preparedat the substrate temperature of 50'C by sputtering. The first nearest neighbordistances of a-Ge and a-Ge:H are longer than that of crystalline germanium, c-Ge, by0.016 A and 0.011 A, respectively. The Debye-Waller factor, Ao, and the third mo-ment of the first nearest neighbor distribution,<.Ar'), were also determined. The rela-tionships among the first nearest neighbor distance, Ao and<,At") are in agreementwith theoretical results derived from thermodynamics. These results suggest the ex-istence of states corresponding to several hundred degrees quenched in a-Ge and a-Ge:H. Furthermore, the state of a-Ge is estimated to be about one hundred degreeshigher than that of a-Ge:H.
- 社団法人日本物理学会の論文
- 1987-05-15
著者
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Nomura Masao
Institute Of Physics College Of Arts And Sciences University Of Tokyo
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WAKAGI Masatoshi
Hitachi Research Laboratory, Hitachi, Ltd.
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NOMURA Masaharu
Photon Factory, Institute of Materials Structure Science, KEK
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Nomura Mitsuhiro
Institute Of Physics University Of Tsukuba:(present Address)fuji Electric Co. Ltd.
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Wakagi Masatoshi
Hitachi Research Laboratory Hitachi Ltd.
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CHIGASAKI Mitsuo
Hitachi Research Laboratory,Hitachi Ltd
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Chigasaki Mitsuo
Hitachi Research Laboratory Hitachi Ltd.
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Nomura Masaharu
Photon Factory High Energy Accelerator Research Organization (kek)
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Wakagi Masatoshi
Hitachi Research Laboratory,Hitachi,Ltd.
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Chigasaki Mitsuo
Hitachi Research Laboratory,Hitachi,Ltd.
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