Protection of Field Oxide in Trench Isolation against Contact Hole Etching to Improve Alignment Tolerance
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1998-07-15
著者
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Tokuda Y
Mitsubishi Electric Corp. Hyogo Jpn
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Tokuda Yasunori
Advanced Technology R&d Center Mitsubishi Electric Corporation
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Tokuda Yasunori
Central Research Laboratory Mitsubishi Electric Corporation
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Abe Yuji
Advanced Technology R&d Center Mitsubishi Electric Corporation
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SHIOZAWA Katsuomi
Advanced Technology R&D Center, Mitsubishi Electric Corporation
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OISHI Toshiyuki
Advanced Technology R&D Center, Mitsubishi Electric Corporation
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Sugihara Kohei
Process & Manufacturing Engineering Center Semiconductor Company Toshiba Corp.
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SUGIHARA Kouhei
Advanced Technology R & D Center, Mitsubishi Electric Corporation
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Tokuda Yasunori
Advanced R&d Technology Center Mitsubishi Electric Corporation
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Shiozawa Katsuomi
Advanced Technology R&d Center Mitsubishi Electric Corporation
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Abe Yuji
Advanced R&d Technology Center Mitsubishi Electric Corporation
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ABE Yuji
Advanced Technology R & D Center, Mitsubishi Electric Corporation
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SHIOZAWA Katsuomi
Advanced Technology R & D Center, Mitsubishi Electric Corporation
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OISHI Toshiyuki
Advanced Technology R & D Center, Mitsubishi Electric Corporation
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SUGIHARA Kouhei
Advanced Technology R & D Center, Mitsubishi Electric Corporation
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