Fabrication Process of Character Projection Mask for EB Lithography

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Development of Scanning Probe Microscope for Auger Analysis
Development of Electron Source for Auger Electron Spectroscopy in Scanning Probe Microscope Systems
Performance Evaluation of Representative Figure Method for Proximity Effect Correction : Electron Beam Lithography
Performance Evaluation of Representative Figure Method for Proximity Effect Correction
Representative Figure Method for Proximity Effect Correction [II]
Representative Figure Method for Proximity Effect Correction
Improved Electron-Beam/Deep-Ultraviolet Intralevel Mix-and-Match Lithography with 100 nm Resolution
Fabrication of Micro-Marks for Electron-Beam Lithography
Fabrication Process of Character Projection Mask for EB Lithography
Molecular and Crystal Structures of 2-(All-trans-Retinylidene)-Indan-1,3-Dione
High-Speed Convolution System for Real-Time Proximity Effect Correction
Proximity Effect Correction For Electron Beam Lithography: Highly Accurate Correction Method
Observation of Solitonlike Excitations in All-trans-β-Carotene Single Crystals
Recovery of SEM Image by In-Situ Cleaning of Contaminated Objective Aperture
Reduction of Electron Beam Drift Caused by Deflecting Electrode by Downflow Cleaning Process
Edge Roughness Study of Chemically Amplified Resist in Low-Energy Electron-Beam Lithography Using Computer Simulation
Contamination Charging up Effect in a Variably Shaped Electron Beam Writer
Electron Beam Calibration Method for Character Projection Exposure System EX-8D
Patterning Accuracy Estimation of Electron Beam Direct-Writing System EX-8D
Evaluation of Shaping Gain Adjustment Accuracy Using Atomic Force Microscope in Variably Shaped Electron-Beam Writing Systems
A Dual-Gate Complementary Metal-Oxide-Semiconductor Technology with Novel Self-Aligned Pocket Implantation which Takes Advantage of Elevated Source/Drain Configurations
Self-Aligned Pocket Implantation into Elevated Source/Drain MOSFETs for Reduction of Junction Capacitance and Leakage Current
Parasitic Resistance Reduction in Deep Submicron Dual-Gate Transistors with Partially Elevated Source/Drain Extension Regions Fabricated by Complementary Metal-Oxide-Semiconductor Technologies
Lithography Simulator for Electon Beam/Deep UV Intra-Level Mix & Match
Advantage of Shallow Trench Isolation over Local Oxidation of Silicon on Alignment Tolerance
Charge-reducing Effect of Chemically Amplified Resist in Electron-Beam Lithography
Protection of Field Oxide in Trench Isolation against Contact Hole Etching to Improve Alignment Tolerance
Microwave Studies of Electron Scattering by Isolated Interstitial Oxygen and Oxygen Complex in Silicon
Fracto-Emission from Glass Fibre Reinforced Plastics at 170-200 K : Exoemission Associated with Mechanical Treatments
Measurements of Photostimulated Electron Emission from Super conducting Metals at 9-300 K : Exoemission Mechanism and Related Phenomena
Noticeable Enhancement of Edge Effect in Short Channel Characteristics of Trench-Isolated MOSFETs
Anomalous Gate Length Dependence of Threshold Voltage of Trench-Isolated Metal Oxide Semiconductor Field Effect Transistors
Narrow-Channel Metal Oxide Semiconductor Field Effect Transistor (MOSFET)Isolated by an Ultra-Fine Trench
The Effect of Down-Flow Cleaning Process on Materials Used in an Electron Beam System
Triangular Shaped Beam Technique in EB Exposure System EX-7 for ULSI Pattern Formation : Lithography Technology
Observation of Thermal Phonon Resonance in Cylindrical Microcavities
Brillouin Scattering Measurement of Optothermally Excited Phonon
Light Beating Spectroscopy of Brillouin Scattering in Solid Polymer
Particle Contamination Control Technology in Electron Beam Mask Writing System for Next-Generation Mask Fabrication
Triangular Shaped Beam Technique in EB Exposure System EX-7 for ULSI Pattern Formation

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