Recovery of SEM Image by In-Situ Cleaning of Contaminated Objective Aperture

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Defect Production in Phosphorus Ion-Implanted SiO_2(43 nm)/Si Studied by a Variable-Energy Positron Beam
Vacancy-Type Defects in As^+-Implanted SiO_2(43 nm)/Si Proved with Slow Positrons
Hydrostatic Pressure Effects on Superconductive Phase Transitions in Y_Ca_xBa_2Cu_3O_ and Y(Ba_La_y)_2Cu_3O_
Improved Electron-Beam/Deep-Ultraviolet Intralevel Mix-and-Match Lithography with 100 nm Resolution
Fabrication of Micro-Marks for Electron-Beam Lithography
Fabrication Process of Character Projection Mask for EB Lithography
Recovery of SEM Image by In-Situ Cleaning of Contaminated Objective Aperture
Reduction of Electron Beam Drift Caused by Deflecting Electrode by Downflow Cleaning Process
Filling a Double-Cusp Magnetic Container with Plasmas Produced by a Long-Pulse CO_2-Laser and Its Confinement Properties
Behavior of Plasma Produced by a Long CO_2-Laser Pulse in a Spindle-Cusp
Edge Roughness Study of Chemically Amplified Resist in Low-Energy Electron-Beam Lithography Using Computer Simulation
Contamination Charging up Effect in a Variably Shaped Electron Beam Writer
A Dual-Gate Complementary Metal-Oxide-Semiconductor Technology with Novel Self-Aligned Pocket Implantation which Takes Advantage of Elevated Source/Drain Configurations
Self-Aligned Pocket Implantation into Elevated Source/Drain MOSFETs for Reduction of Junction Capacitance and Leakage Current
Parasitic Resistance Reduction in Deep Submicron Dual-Gate Transistors with Partially Elevated Source/Drain Extension Regions Fabricated by Complementary Metal-Oxide-Semiconductor Technologies
Lithography Simulator for Electon Beam/Deep UV Intra-Level Mix & Match
Advantage of Shallow Trench Isolation over Local Oxidation of Silicon on Alignment Tolerance
Charge-reducing Effect of Chemically Amplified Resist in Electron-Beam Lithography
Protection of Field Oxide in Trench Isolation against Contact Hole Etching to Improve Alignment Tolerance
Microwave Studies of Electron Scattering by Isolated Interstitial Oxygen and Oxygen Complex in Silicon
Fracto-Emission from Glass Fibre Reinforced Plastics at 170-200 K : Exoemission Associated with Mechanical Treatments
Measurements of Photostimulated Electron Emission from Super conducting Metals at 9-300 K : Exoemission Mechanism and Related Phenomena
Effect of the Electron-Irradiation-Induced-Contamination of the Etching Process of a Photoresist
Noticeable Enhancement of Edge Effect in Short Channel Characteristics of Trench-Isolated MOSFETs
Anomalous Gate Length Dependence of Threshold Voltage of Trench-Isolated Metal Oxide Semiconductor Field Effect Transistors
Narrow-Channel Metal Oxide Semiconductor Field Effect Transistor (MOSFET)Isolated by an Ultra-Fine Trench
The Effect of Down-Flow Cleaning Process on Materials Used in an Electron Beam System
Particle Contamination Control Technology in Electron Beam Mask Writing System for Next-Generation Mask Fabrication
Voltage Contrast Defect Inspection of Contacts and Vias for Deep Quarter Micron Devices
A New Autofocus Using Image Processing Techniques in Critical Dimension Measurement SEM(Special Issue on Test and Diagnosis of VLSI)

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