Effect of the Electron-Irradiation-Induced-Contamination of the Etching Process of a Photoresist
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1987-03-20
著者
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MIYOSHI Motosuke
Toshiba Integrated Circuit Manufacturing Engineering Department
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OKUMURA Katsuya
TOSHIBA at IBM Semiconductor Research & Development Center
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Okumura Katsuya
Toshiba Corporation Integrated Circuits Division
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NORIMATSU Kenji
Toshiba Corporation, Integrated Circuits Division
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Norimatsu Kenji
Toshiba Corporation Integrated Circuits Division
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Miyoshi Motosuke
Toshiba Corp. Integrated Circuit Advanced Process Engineering Department
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Miyoshi Motosuke
Toshiba Corporation Integrated Circuits Division
関連論文
- Recovery of SEM Image by In-Situ Cleaning of Contaminated Objective Aperture
- Sequential Thermal CVD Process Using Fast Thermal Processor(FTP)
- Effect of the Electron-Irradiation-Induced-Contamination of the Etching Process of a Photoresist
- Voltage Contrast Defect Inspection of Contacts and Vias for Deep Quarter Micron Devices
- A New Autofocus Using Image Processing Techniques in Critical Dimension Measurement SEM(Special Issue on Test and Diagnosis of VLSI)