Particle Contamination Control Technology in Electron Beam Mask Writing System for Next-Generation Mask Fabrication

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概要

• 論文の詳細を見る

• An in-situ measurement system for particles in an electron beam (EB) writer is developed to improve mask yield management. The system has satisfied the required installation specifications for a mask blank inspection system for the EB writer, and the results of an experiment using the system prove that particles added from the mask handling system itt our EB writer satisfy the total particle count specification (< 1.25 counts/cycle for 6 inch mask). The investigation of particle increase after repeated mask movement has been carried out in each segmented mask handling route. It has been clarified that the segmentation test using this system is helpful for investigation of the origin of particle production on a mask. Effective application of information such as particle position and size obtained by this system will be very useful for improving mask yield management in the mask fabrication process in terms of pattern inspection and repair system.

• 社団法人応用物理学会の論文
• 2002-09-15

著者

• Noguchi Shigeru

  Semiconductor Components Operations Dai Nippon Printing Co. Ltd.

• TOJO Toru

  Advanced Research Laboratory, R&D Center, Toshiba Corporation

• Ogasawara M

  Pioneer Corp. Saitama Jpn

• Tojo Toru

  Advanced Research Laboratory R&d Center Toshiba Corporation

• AKENO Kiminobu

  Advanced LSI Laboratory, Corporate R&D Center, Toshiba Corporation

• OGASAWARA Munehiro

  Advanced LSI Laboratory, Corporate R&D Center, Toshiba Corporation

• GOKI Kenji

  Advanced LSI Laboratory, Corporate R&D Center, Toshiba Corporation

• HIRANO Ryoichi

  EB Mask Equipment Engineering Group, EB Mask Equipment Engineering Department, Semiconductor Equipme

• YOSHITAKE Shusuke

  EB Mask Equipment Engineering Group, EB Mask Equipment Engineering Department, Semiconductor Equipme

• TORIUMI Masaki

  EB Mask Equipment Engineering Group, EB Mask Equipment Engineering Department, Semiconductor Equipme

• SEKINE Akihiko

  Optical Engineering Laboratory, R&D Center, Topcon Corporation

• TAKIGAWA Tadahiko

  Semiconductor Components Operations, Dai Nippon Printing Co., Ltd.

• SHINODA Toshiki

  Semiconductor Components Operations, Dai Nippon Printing Co., Ltd.

• Toriumi Masaki

  Eb Mask Equipment Engineering Group Eb Mask Equipment Engineering Department Semiconductor Equipment

• Akeno Kiminobu

  Advanced Lsi Laboratory Corporate R&d Center Toshiba Corporation

• Takigawa T

  Semiconductor Components Operations Dai Nippon Printing Co. Ltd.

• Yoshitake Shusuke

  Eb Mask Equipment Engineering Group Eb Mask Equipment Engineering Department Semiconductor Equipment

• Hirano R

  Nikko Materials Co. Ltd. Ibaraki Jpn

• Tojo Toru

  Advanced Lsi Laboratory Corporate R&d Center Toshiba Corporation

• Goki Kenji

  Advanced Lsi Laboratory Corporate R&d Center Toshiba Corporation

• Sekine Akihiko

  Optical Engineering Laboratory R&d Center Topcon Corporation

• Shinoda Toshiki

  Semiconductor Components Operations Dai Nippon Printing Co. Ltd.

• Ooki Kenji

  Advanced LSI Laboratory, Corporate R&D Center, Toshiba Corporation

• Ogasawara Munehiro

  Advanced LSI Laboratory, Corporate R&D Center, Toshiba Corporation

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