High-Accuracy Proximity Effect Correction for Mask Writing

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概要

• 論文の詳細を見る
• 2007-02-15

著者

• Abe Takayuki

  Advanced Ulsi Process Engineering Department Ii Process And Manufacturing Engineering Center Semicon

• HATTORI Yoshiaki

  Advanced Research Laboratory, R&D Center, Toshiba Corporation

• IIJIMA Tomohiro

  Advanced ULSI Process Engineering Department II, Process and Manufacturing Engineering Center, Semic

• ANZE Hirohito

  Advanced ULSI Process Engineering Department II, Process and Manufacturing Engineering Center, Semic

• OOGI Susumu

  Advanced ULSI Process Engineering Department II, Process and Manufacturing Engineering Center, Semic

• KAMIKUBO Takashi

  Advanced ULSI Process Engineering Department II, Process and Manufacturing Engineering Center, Semic

• TSUCHIYA Seiichi

  EB Mask Equipment Engineering Department, Nuflare Technology, Inc.

• SHIMIZU Mitsuko

  Advanced Research Laboratory, R&D Center, Toshiba Corporation

• MATSUKI Kazuto

  Advanced Research Laboratory, R&D Center, Toshiba Corporation

• INOUE Hideo

  EB Mask Equipment Engineering Department, Nuflare Technology, Inc.

• TOJO Toru

  Advanced Research Laboratory, R&D Center, Toshiba Corporation

• TAKIGAWA Tadahiro

  Marketing Department, Nuflare Technology Inc.

• Anze Hiroto

  Advanced Ulsi Process Engineering Department Ii Process And Manufacturing Engineering Center Semicon

• Shimizu M

  Tokyo Univ. Agriculture & Technol. Koganei

• Hattori Y

  Advanced Research Laboratory R&d Center Toshiba Corporation

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