A Chromatic Aberration-Free Heterodyne Alignment for Optical Lithography
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1990-11-20
著者
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Tabata M
Toshiba Corp. Kawasaki Jpn
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MATSUMOTO Mitsuhiro
Nara Prefectural Institute of Public Health
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Tabata M
Hokkaido Univ. Sapporo Jpn
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HIGASHIKI Tatsuhiko
Research and Development Center, Toshiba Corporation
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TOJO Toru
Research and Development Center, Toshiba Corporation
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TABATA Mitsuo
Research and Development Center, Toshiba Corporation
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NISHIZAKA Takeshi
Research and Development Center, Toshiba Corporation
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MATSUMOTO Mitsuo
Heavy Apparatus Engineering Laboratory, Toshiba Corp
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SAMEDA Yoshito
Heavy Apparatus Engineering Laboratory, Toshiba Corp
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Matsumoto Michio
Faculty Of Engineering Yamanashi University
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Matsumoto M
National Inst. Materials And Chemical Res. Tsukuba Jpn
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Tojo Toru
Advanced Research Laboratory R&d Center Toshiba Corporation
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Tojo Toru
Research And Development Center Toshiba Corporation
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Sameda Yoshito
Heavy Apparatus Engineering Laboratory Toshiba Corp
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Matsumoto M
Nara Prefectural Institute Of Public Health
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Higashiki Tatsuhiko
Research And Development Center Toshiba Corporation
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Nishizaka Takeshi
Toshiba Research And Development Center Toshiba Corporation
関連論文
- Low-Frequency Waves in SF_6 Positive Columns Diluted with N_2 Gas
- Attachment-Enhanced Instability in CF_4 Positive Columns
- Forward Waves Excited by Pulsed Electron Beam Injection into Low-Pressure N_2 Gas
- Discharge and Oscillation due to Axial Injection of an Impulsive Electron Beam into SF_6 Gas
- MATERIAL DAMAGE BY ACIDIC DEPOSITION IN EAST ASAIA (IX) MONITORING OF LOWER CARBOXYLIC ACIDS IN WOODEN STORAGE CELLARS AT MUSEUMS (Atmospheric Environment and Cultural Properties)
- Fabrication of Multilayers with Growth Controlled by Sequential Surface Chemical Reactions
- Comparative Study of Al_2O_3 Optical Crystalline Thin Films Grown by Vapor Combinations of Al(CH_3)_3/N_2O and Al(CH_3)_3/H_2O_2
- Reliability of Dielectric Layers for Magneto-Optical Storage Media
- 0.05 μm (3σ) Overlay Accuracy Through-the-lens Alignment in an Excimer Laser Lithography System
- A chromatic Aberration-Free Heterodyne Alignment for Optical Lithography : Lithography Technology
- A Chromatic Aberration-Free Heterodyne Alignment for Optical Lithography
- Relativistic Theory of Particle Acceleration by an Obliquely Propagating Electrostatic Wave in a Static Magnetic Field
- Electron Acceleration by Beat Wave of Two Gaussian Laser Beams in Vacuum
- Negative Tone Dry Development of Si-Containing Resists by Laser Ablation
- New Dry Surface-Imaging Process for X-Ray Lithography
- High-Speed Convolution System for Real-Time Proximity Effect Correction
- Proximity Effect Correction For Electron Beam Lithography: Highly Accurate Correction Method
- Photon-Stimulated Ion Desorption Measurement of Organosilicon Resist Reactions in Extreme Ultraviolet Lithography
- Electric and Magnetic Fields Generated by Particles Trapped by an Electromagnetic Wave in a Transverse Static Magnetic Field
- High-Power 780 nm AlGaAs Narrow-Stripe Window Structure Lasers with Window Grown on Facets
- Highly Reliable 150 mW CW Operation of Single-Stripe AlGaAs Lasers with Window Grown on Facets
- SiO_2/Si Interfaces Studied by STM and HRTEM(II) : Etching and Deposition Technology
- SiO_2/Si Interfaces Studied by STM and HRTEM (II)
- Ion Temperature Effect on the Contracted Density Distributions in a Magnetized Electronegative Gas Positive Column
- Phased-Array with the "YY" Shaped Symmetrically Branching Waveguide (SBW)
- The Effect of Down-Flow Cleaning Process on Materials Used in an Electron Beam System
- A Mask-to-Wafer Fine Gap Setting Method
- Particle Contamination Control Technology in Electron Beam Mask Writing System for Next-Generation Mask Fabrication
- Low Frequency Waves with Azimuthal Currents in a Weakly Magnetized Positive Column
- Anomalous d. c. Resistivity in a Turbulent Plasma
- Low Frequency Waves Excited in a Magnetized Electronegative Gas Positive Column
- Radial Density Distributions in a Magnetized Electronegative Gas Positive Column