CPM2000-71 Ta窒化物のTa-Al化合物膜への代替による薄膜キャパシタの容量低減の抑制効果
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概要
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Taの代りにTa窒化物を利用した陽極酸化膜キャパシタは、耐熱性は向上するが容量の低減を伴う。一方、化学量論的な金属間化合物は、一般に高温での安定性に優れているので、弁金属同士からなる化学量論的な金属間化合物の陽極酸化膜をキャパシタに用いれば、高耐熱な特徴を保持したまま、容量の低下も抑制できるものと期待される。そこで、Ta窒化物の代りに代表的な弁金属であるAlとTaに着目して、化学量論的なAl_3Ta金属間化合物膜を作製し、その陽極酸化膜のキャパシタ特性を評価した。その結果、Al_3Ta陽極酸化膜キャパシタは、容量の低下をTaの値の2割程度までに抑制したまま、Ta_2N陽極酸化膜キャパシタに次ぐ、高耐熱な薄膜キャパシタとなる事が判った。
- 社団法人電子情報通信学会の論文
- 2000-08-17
著者
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佐々木 克孝
Department Of Materials Science Kitami Institute Of Technology
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阿部 良夫
Department Of Materials Science Kitami Institute Of Technology
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田邉 彩
北見工業大学工学部機能材料工学科
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山根 美佐雄
北見工業大学工学部機能材料工学科
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Abe Yuji
Advanced Technology R&d Center Mitsubishi Electric Corporation
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Abe Y
Mitsubishi Electric Corp. Hyogo Jpn
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Abe Yoichi
Department Of Applied Science Tokyo Electrical Engineering College
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阿部 良夫
北見工業大学マテリアル工学科
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佐々木 克孝
北見工業大学
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