Oriented Growth of Cu(110) on YSi_<2-x>(1100)/Si(100) and Diffusion Behavior in Copper Silicide Formation
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1994-06-15
著者
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NOMURA Kouichi
Department of Pathology, The Jikei University School of Medicine
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SASAKI Katsutaka
Department of Materials Science, Kitami Institute of Technology
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NOYA Atsushi
Department of Electrical and Electronic Engineering, Faculty of Engineering, Kitami Institute of Tec
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Noya Atsushi
Department Of Electrical And Electronic Engineering Faculty Of Engineering Kitami Institute Of Techn
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Nomura Kouichi
Department Of Electrical And Electronic Engineering Faculty Of Engineering Kitami Institute Of Techn
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Sasaki Katsutaka
Department Of Electrical And Electronic Engineering Faculty Of Engineering Kitami Institute Of Techn
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SUNAGA Kouji
Department of Electrical and Electronic Engineering, Faculty of Engineering, Kitami Institute of Tec
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Sunaga Kouji
Department Of Electrical And Electronic Engineering Faculty Of Engineering Kitami Institute Of Techn
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Noya Atsushi
Department Of Electrical And Electronic Engineering Faculty Of Engineering Kitami Institute Of Techn
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