NOYA Atsushi | Department of Electrical and Electronic Engineering, Faculty of Engineering, Kitami Institute of Tec
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概要
- 同名の論文著者
- Department of Electrical and Electronic Engineering, Faculty of Engineering, Kitami Institute of Tecの論文著者
関連著者
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NOYA Atsushi
Department of Electrical and Electronic Engineering, Faculty of Engineering, Kitami Institute of Tec
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Noya Atsushi
Department Of Electrical And Electronic Engineering Faculty Of Engineering Kitami Institute Of Techn
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TAKEYAMA Mayumi
Department of Electrical and Electronic Engineering, Faculty of Engineering, Kitami Institute of Tec
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Takeyama Mayumi
Department Of Electrical And Electronic Engineering Faculty Of Engineering Kitami Institute Of Techn
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小間 篤
Department Of Chemistry The University Of Tokyo
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Maniruzzaman Md.
Department Of Electrical And Electronic Engineering Faculty Of Engineering Kitami Institute Of Techn
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Takeyama Mayumi
Department Of Electrical And Electronic Engineering Faculty Of Engineering Kitami Institute Of Techn
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Hayasaka Yuichiro
Institute For Materials Research Tohoku University
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AOYAGI Eiji
Institute for Materials Research, Tohoku University
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Aoyagi Eiji
Institute For Materials Research Tohoku University
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SASAKI Katsutaka
Department of Materials Science, Kitami Institute of Technology
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Sasaki Katsutaka
Department Of Electrical And Electronic Engineering Faculty Of Engineering Kitami Institute Of Techn
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Sato Masaru
Department of Oral Pathology, Asahi University School of Dentistry
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OHSUNA Tetu
Institute for Materials Research, Tohoku University
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Ohsuna Tetu
Institute For Materials Research Tohoku University
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Sato Masaru
Department Of Applied Chemistry School Of Advanced Science And Engineering Faculty Of Science And En
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Sato Masaru
Department Of Electrical And Electronic Engineering Faculty Of Engineering Kitami Institute Of Techn
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Noya Atsushi
Institute for Materials Research, Tohoku University
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NOMURA Kouichi
Department of Pathology, The Jikei University School of Medicine
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Seki H
Ibm Almaden Res. Center Ca Usa
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Seki Hikaru
Department Of Electrical And Electronic Engineering Faculty Of Engineering Kitami Institute Of Techn
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SAKANISHI Kouichirou
Department of Electrical and Electronic Engineering, Faculty of Engineering, Kitami Institute of Tec
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Noya Atsushi
Department Of Electronic Engineering Faculty Of Engineering Kitami Institute Of Tecknology
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Nomura Kouichi
Department Of Electrical And Electronic Engineering Faculty Of Engineering Kitami Institute Of Techn
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Sasaki Katsutaka
Department Of Electronic Engineering Faculty Of Engineering Kitami Institute Of Tecknology
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Sasaki Katsutaka
Department Of Electronic Engineering Faculty Of Engineering Kitami Institute Of Technology
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Takeyama M
Kitami Inst. Technol. Kitami Jpn
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SUNAGA Kouji
Department of Electrical and Electronic Engineering, Faculty of Engineering, Kitami Institute of Tec
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Ohtaka Shirou
Department of Electronic Engineering, Faculty of Engineering, Kitami Institute of Tecknology
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Sasao Nobuyuki
Department of Electronic Engineering, Faculty of Engineering, Kitami Institute of Tecknology
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Sunaga Kouji
Department Of Electrical And Electronic Engineering Faculty Of Engineering Kitami Institute Of Techn
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Ohtaka Shirou
Department Of Electronic Engineering Faculty Of Engineering Kitami Institute Of Tecknology
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Sasao Nobuyuki
Department Of Electronic Engineering Faculty Of Engineering Kitami Institute Of Tecknology
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FUKUDA Tomoyuki
Department of Electrical and Electronic Engineering, Faculty of Engineering, Kitami Institute of Tec
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Noya Atsushi
Department Of Electrical And Electronic Engineering Faculty Of Engineering Kitami Institute Of Techn
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Noya Atsushi
Department Of Electrical And Electronic Engineering Faculty Of Engineering Kitami Institute Of Techn
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Noya Atsushi
Department Of Electrical And Electronic Engineering Faculty Of Engineering Kitami Institute Of Techn
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Noya Atsushi
Department Of Electrical And Electronic Engineering Faculty Of Engineering Kitami Institute Of Techn
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Noya Atsushi
Department Of Electrical And Electronic Engineering Faculty Of Engineering Kitami Institute Of Techn
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Takeyama Mayumi
Department Of Electrical And Electronic Engineering Faculty Of Engineering Kitami Institute Of Techn
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Takeyama Mayumi
Department Of Electrical And Electronic Engineering Faculty Of Engineering Kitami Institute Of Techn
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Takeyama Mayumi
Department Of Electrical And Electronic Engineering Faculty Of Engineering Kitami Institute Of Techn
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Takeyama Mayumi
Department Of Electrical And Electronic Engineering Faculty Of Engineering Kitami Institute Of Techn
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Sakanishi Kouichirou
Department Of Electrical And Electronic Engineering Faculty Of Engineering Kitami Institute Of Techn
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Fukuda Tomoyuki
Department Of Biophysics Graduate School Of Science Kyoto University
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Fukuda Tomoyuki
Department Of Electrical And Electronic Engineering Faculty Of Engineering Kitami Institute Of Techn
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SEKI Hikaru
Department of Biotechnology, Graduate School of Engineering, Osaka University
著作論文
- Solid-Phase Reactions of Diffusion Barriers of Ti and TiN to Copper Layers on SiO_2
- Evaluation of [111]-Textured Cu Layer Formed on Thin Nb Barrier Layer on SiO_2(Session 8A Silicon Devices V,AWAD2006)
- Evaluation of [111]-Textured Cu Layer Formed on Thin Nb Barrier Layer on SiO_2(Session 8A Silicon Devices V)
- Formation of Preferentially Oriented Cu [111] Layer on Nb [110] Barrier on SiO_2
- Structural Analyses of Cu[111] Layer on Nb[110] Barrier Formed on SiO_2(AWAD2003 : Asia-Pacific Workshop on Fundamental and Application of Advanced Semiconductor Devices)
- Structural Analyses of Cu[111] Layer on Nb[110] Barrier Formed on SiO_2 (AWAD2003 (Asia-Pacific Workshop on Fundamental and Application of Advanced Semiconductor Devices))
- Formation of [111] Preferentially Oriented Cu Layer on [110] Nb Barrier on SiO_2
- Formation of [111] Preferentially Oriented Cu Layer on [110] Nb Barrier on SiO_2
- Oriented Growth of Cu(110) on YSi_(1100)/Si(100) and Diffusion Behavior in Copper Silicide Formation
- Auger Electron Spectroscopy Study on the Stability of the Interface between Deposited Cu_9Al_4 Intermetallic Compound Film and Si
- Auger Electron Spectroscopy Study on the Characterization and Stability of the Cu_9Al_4/TiN/Si System
- Thermal Stability of W_2N Compound Barrier in W/W_2N/poly-Si Gate Electrode Configuration(Electronic Materials)
- Effectiveness of Al_W Layer on Suppression of Spontaneous Reaction in Al/Al_W/W_2N/Si Contact Systems
- Solid-Phase Reactions in Polymorphic Epitaxial Contact Systems of Al/YSi_/Si
- Preparation of WN_x Films and Their Diffusion Barrier Properties in Cu/Si Contact Systems
- Thermal Stability of W_2N Compound Barrier in W/W_2N/poly-Si Gate Electrode Configuration