Maniruzzaman Md. | Department Of Electrical And Electronic Engineering Faculty Of Engineering Kitami Institute Of Techn

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概要

• Maniruzzaman Md.の詳細を見る
• 同名の論文著者
• Department Of Electrical And Electronic Engineering Faculty Of Engineering Kitami Institute Of Technの論文著者

関連著者

• Maniruzzaman Md.

  Department Of Electrical And Electronic Engineering Faculty Of Engineering Kitami Institute Of Techn

• Noya Atsushi

  Department Of Electrical And Electronic Engineering Faculty Of Engineering Kitami Institute Of Techn

• Takeyama Mayumi

  Department Of Electrical And Electronic Engineering Faculty Of Engineering Kitami Institute Of Techn

• 小間 篤

  Department Of Chemistry The University Of Tokyo

• TAKEYAMA Mayumi

  Department of Electrical and Electronic Engineering, Faculty of Engineering, Kitami Institute of Tec

• NOYA Atsushi

  Department of Electrical and Electronic Engineering, Faculty of Engineering, Kitami Institute of Tec

• Hayasaka Yuichiro

  Institute For Materials Research Tohoku University

• Aoyagi Eiji

  Institute For Materials Research Tohoku University

• Takeyama Mayumi

  Department Of Electrical And Electronic Engineering Faculty Of Engineering Kitami Institute Of Techn

• AOYAGI Eiji

  Institute for Materials Research, Tohoku University

• Sato Masaru

  Department Of Applied Chemistry School Of Advanced Science And Engineering Faculty Of Science And En

• Sato Masaru

  Department of Oral Pathology, Asahi University School of Dentistry

• OHSUNA Tetu

  Institute for Materials Research, Tohoku University

• Ohsuna Tetu

  Institute For Materials Research Tohoku University

• Sato Masaru

  Department Of Electrical And Electronic Engineering Faculty Of Engineering Kitami Institute Of Techn

• Noya Atsushi

  Institute for Materials Research, Tohoku University

• Takeyama Mayumi

  Department of Electrical and Electronic Engineering, Faculty of Engineering, Kitami Institute of Technology, Kitami, Hokkaido 090-8507, Japan

• Aoyagi Eiji

  Institute for Materials Research, Tohoku University, Sendai 980-8577, Japan

• Sato Masaru

  Department of Electrical and Electronic Engineering, Faculty of Engineering, Kitami Institute of Technology, Kitami, Hokkaido 090-8507, Japan

• Hayasaka Yuichiro

  Institute for Materials Research, Tohoku University, Sendai 980-8577, Japan

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著作論文

• Evaluation of [111]-Textured Cu Layer Formed on Thin Nb Barrier Layer on SiO_2(Session 8A Silicon Devices V,AWAD2006)
• Evaluation of [111]-Textured Cu Layer Formed on Thin Nb Barrier Layer on SiO_2(Session 8A Silicon Devices V)
• Formation of Preferentially Oriented Cu [111] Layer on Nb [110] Barrier on SiO_2
• Structural Analyses of Cu[111] Layer on Nb[110] Barrier Formed on SiO_2(AWAD2003 : Asia-Pacific Workshop on Fundamental and Application of Advanced Semiconductor Devices)
• Structural Analyses of Cu[111] Layer on Nb[110] Barrier Formed on SiO_2 (AWAD2003 (Asia-Pacific Workshop on Fundamental and Application of Advanced Semiconductor Devices))
• Formation of [111] Preferentially Oriented Cu Layer on [110] Nb Barrier on SiO_2
• Formation of [111] Preferentially Oriented Cu Layer on [110] Nb Barrier on SiO_2
• Preferentially Oriented Cu[111] Layer Formed on Thin Nb Barrier on SiO2
• Preferentially Oriented Cu[111] Layer Formed on Thin Nb Barrier on SiO2

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