Aoyagi Eiji | Institute for Materials Research, Tohoku University, Sendai 980-8577, Japan
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概要
- Aoyagi Eijiの詳細を見る
- 同名の論文著者
- Institute for Materials Research, Tohoku University, Sendai 980-8577, Japanの論文著者
関連著者
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Noya Atsushi
Department Of Electrical And Electronic Engineering Faculty Of Engineering Kitami Institute Of Techn
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Takeyama Mayumi
Department Of Electrical And Electronic Engineering Faculty Of Engineering Kitami Institute Of Techn
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Aoyagi Eiji
Institute For Materials Research Tohoku University
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Sato Masaru
Department Of Applied Chemistry School Of Advanced Science And Engineering Faculty Of Science And En
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Aoyagi Eiji
Institute for Materials Research, Tohoku University, Sendai 980-8577, Japan
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Maniruzzaman Md.
Department Of Electrical And Electronic Engineering Faculty Of Engineering Kitami Institute Of Techn
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Hayasaka Yuichiro
Institute For Materials Research Tohoku University
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Ito Shun
Institute For Materials Research Tohoku University
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Takeyama Mayumi
Department of Electrical and Electronic Engineering, Faculty of Engineering, Kitami Institute of Technology, Kitami, Hokkaido 090-8507, Japan
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Sato Masaru
Department of Electrical and Electronic Engineering, Faculty of Engineering, Kitami Institute of Technology, Kitami, Hokkaido 090-8507, Japan
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Hayasaka Yuichiro
Institute for Materials Research, Tohoku University, Sendai 980-8577, Japan
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Sudoh Hiroshi
Gas-Phase Growth Ltd., Koganei, Tokyo 184-0012, Japan
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Machida Hideaki
Gas-Phase Growth Ltd., Koganei, Tokyo 184-0012, Japan
著作論文
- Atomic Layer Deposition of Thin VNx Film from Tetrakis(diethylamido)vanadium Precursor
- Preferentially Oriented Cu[111] Layer Formed on Thin Nb Barrier on SiO2