Aoyagi Eiji | Institute For Materials Research Tohoku University
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概要
関連著者
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Aoyagi Eiji
Institute For Materials Research Tohoku University
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Takeyama Mayumi
Department Of Electrical And Electronic Engineering Faculty Of Engineering Kitami Institute Of Techn
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Noya Atsushi
Department Of Electrical And Electronic Engineering Faculty Of Engineering Kitami Institute Of Techn
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Hayasaka Yuichiro
Institute For Materials Research Tohoku University
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AOYAGI Eiji
Institute for Materials Research, Tohoku University
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Sato Masaru
Department Of Applied Chemistry School Of Advanced Science And Engineering Faculty Of Science And En
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Maniruzzaman Md.
Department Of Electrical And Electronic Engineering Faculty Of Engineering Kitami Institute Of Techn
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小間 篤
Department Of Chemistry The University Of Tokyo
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TAKEYAMA Mayumi
Department of Electrical and Electronic Engineering, Faculty of Engineering, Kitami Institute of Tec
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NOYA Atsushi
Department of Electrical and Electronic Engineering, Faculty of Engineering, Kitami Institute of Tec
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Takeyama Mayumi
Department Of Electrical And Electronic Engineering Faculty Of Engineering Kitami Institute Of Techn
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HIRAGA Kenji
Institute for Materials Research, Tohoku University
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Hiraga Kenji
Institute For Materials Research
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Sato Masaru
Department of Oral Pathology, Asahi University School of Dentistry
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Ito Shun
Institute For Materials Research Tohoku University
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Hiraga K
Institute For Materials Research Tohoku University
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OHSUNA Tetu
Institute for Materials Research, Tohoku University
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Sasaki Katsutaka
Department Of Electrical And Electronic Engineering Faculty Of Engineering Kitami Institute Of Techn
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Ohsuna Tetu
Institute For Materials Research Tohoku University
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Takeyama M
Kitami Inst. Technol. Kitami Jpn
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Aoyagi E
Tohoku Univ. Sendai Jpn
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Sato Masaru
Department Of Electrical And Electronic Engineering Faculty Of Engineering Kitami Institute Of Techn
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Noya Atsushi
Institute for Materials Research, Tohoku University
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Aoyagi Eiji
Institute for Materials Research, Tohoku University, Sendai 980-8577, Japan
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向田 昌志
九大工
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Kita Ryusuke
Shizuoka University
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WATANABE Kazuo
Institute for Materials Research, Tohoku University
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AWAJI Satoshi
Institute for Materials Research, Tohoku University
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ITO Shun
Institute for Materials Research, Tohoku University
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向田 昌志
山形大学工学部電気電子工学科
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YAMAGUCHI Akira
Department of Chemistry, Graduate School of Science, Tohoku University
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Kita Ryusuke
Shizuoka Univ. Hamamatsu Jpn
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Mukaida Masashi
Kyushu Univ. Fukuoka Jpn
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Mukaida Masashi
Kyushu University
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Saito Atsushi
High Field Laboratory For Superconducting Materials Institute For Materials Research Tohoku Universi
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Awaji Satoshi
Institute For Materials Research Tohoku University
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WATAZAWA Keiichi
Sumitomo Heavy Industries Ltd.
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Watanabe Kazuo
Institute For Materials Research Tohoku University
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Namba Masafumi
Institute For Materials Research Tohoku University
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Mukaida M
Department Of Materials Science And Engineering Kyushu University
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MUKAIDA Masashi
NTT System Electronics Laboratories
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KAI Hideki
Kyushu University
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Echigoya Jun-ichi
Department Of Materials Science And Engineering Iwate University
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Echigoya Jun-ichi
Department Of Materials And Technology Faculty Of Engineering Iwate University
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Hayasaka Y
Institute For Materials Research Tohoku University
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Saito Atsushi
Institute For Materials Research Tohoku University
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Mukaida M
Kyushu University
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向田 昌志
九州大学・大学院工学研究院・材料工学部門
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Yamaguchi Akira
Department Of Chemistry Graduate School Of Science Tohoku University
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Watanabe K
High Field Laboratory For Superconducting Materials Institute For Materials Research Tohoku Universi
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Yamaguchi Akira
Department Of Biology Faculty Of Science Hirosaki University
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Yamaguchi Akira
Department Of Materials And Technology Faculty Of Engineering Iwate University
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AWAJI Satoshi
Institute for Matererials Research, Tohoku University
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WATANABE Kazuo
Institute for Matererials Research, Tohoku University
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Atsushi Noya
Department of Electrical and Electronic Engineering, Faculty of Engineering, Kitami Institute of Technology, Kitami, Hokkaido 090-8507, Japan
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Takeyama Mayumi
Department of Electrical and Electronic Engineering, Faculty of Engineering, Kitami Institute of Technology, Kitami, Hokkaido 090-8507, Japan
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Mayumi B.
Department of Electrical and Electronic Engineering, Faculty of Engineering, Kitami Institute of Technology, Kitami, Hokkaido 090-8507, Japan
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Sato Masaru
Department of Electrical and Electronic Engineering, Faculty of Engineering, Kitami Institute of Technology, Kitami, Hokkaido 090-8507, Japan
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Hayasaka Yuichiro
Institute for Materials Research, Tohoku University, Sendai 980-8577, Japan
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Sudoh Hiroshi
Gas-Phase Growth Ltd., Koganei, Tokyo 184-0012, Japan
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Machida Hideaki
Gas-Phase Growth Ltd., Koganei, Tokyo 184-0012, Japan
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Hayasaka Yuichirou
Institute for Materials Research, Tohoku University, Sendai 980-8577, Japan
著作論文
- Effects of BaMO_3 (M = Zr, Sn) Nanorods on Critical Temperature of ErBa_2Cu_3O_y Films
- Evaluation of [111]-Textured Cu Layer Formed on Thin Nb Barrier Layer on SiO_2(Session 8A Silicon Devices V,AWAD2006)
- Evaluation of [111]-Textured Cu Layer Formed on Thin Nb Barrier Layer on SiO_2(Session 8A Silicon Devices V)
- Formation of Preferentially Oriented Cu [111] Layer on Nb [110] Barrier on SiO_2
- Structural Analyses of Cu[111] Layer on Nb[110] Barrier Formed on SiO_2(AWAD2003 : Asia-Pacific Workshop on Fundamental and Application of Advanced Semiconductor Devices)
- Structural Analyses of Cu[111] Layer on Nb[110] Barrier Formed on SiO_2 (AWAD2003 (Asia-Pacific Workshop on Fundamental and Application of Advanced Semiconductor Devices))
- Transmission electron microscopy studies of grain boundaries in InP
- Transmissin Electron Microscopy Observation of Polymorphic Epitaxial Growth of YSi_ Layer in Al(001)/YSi_/Si(001) Systems
- Thermal Stability of W_2N Film as a Diffusion Barrier between Al and Si
- Barrier Properties of Thin ZrNx Films Prepared by Radical-Assisted Surface Reaction
- Atomic Layer Deposition of Thin VNx Film from Tetrakis(diethylamido)vanadium Precursor
- Application of Extremely Thin ZrN Film as Diffusion Barrier between Cu and SiOC
- Reactively Sputtered Nanocrystalline ZrN Film as Extremely Thin Diffusion Barrier between Cu and SiO2
- Preferentially Oriented Cu[111] Layer Formed on Thin Nb Barrier on SiO2