Takeyama M | Kitami Inst. Technol. Kitami Jpn

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概要

• 同名の論文著者
• Kitami Inst. Technol. Kitami Jpnの論文著者

関連著者

• Noya Atsushi

  Department Of Electrical And Electronic Engineering Faculty Of Engineering Kitami Institute Of Techn

• Takeyama M

  Kitami Inst. Technol. Kitami Jpn

• Takeyama Mayumi

  Department Of Electrical And Electronic Engineering Faculty Of Engineering Kitami Institute Of Techn

• Sasaki Katsutaka

  Department Of Electrical And Electronic Engineering Faculty Of Engineering Kitami Institute Of Techn

• HIRAGA Kenji

  Institute for Materials Research, Tohoku University

• Hiraga K

  Institute For Materials Research Tohoku University

• Hiraga Kenji

  Institute For Materials Research

• Aoyagi E

  Tohoku Univ. Sendai Jpn

• Aoyagi Eiji

  Institute For Materials Research Tohoku University

• Ichikawa T

  Fdk Corp. Shizuoka Jpn

• Ichikawa Takaaki

  Department Of Applied Physics Okayama University Of Science

• Seki H

  Ibm Almaden Res. Center Ca Usa

• Seki Hikaru

  Department Of Electrical And Electronic Engineering Faculty Of Engineering Kitami Institute Of Techn

• SASAKI Katsutaka

  Department of Materials Science, Kitami Institute of Technology

• TAKEYAMA Mayumi

  Department of Electrical and Electronic Engineering, Faculty of Engineering, Kitami Institute of Tec

• NOYA Atsushi

  Department of Electrical and Electronic Engineering, Faculty of Engineering, Kitami Institute of Tec

• SAKANISHI Kouichirou

  Department of Electrical and Electronic Engineering, Faculty of Engineering, Kitami Institute of Tec

• Taguchi Masahiro

  Department Of Molecular Biotechnology Graduate School Of Advanced Sciences Of Matter Hiroshima Unive

• Sakanishi Kouichirou

  Department Of Electrical And Electronic Engineering Faculty Of Engineering Kitami Institute Of Techn

• Taguchi Masahiro

  Department Of Electrical And Electronic Engineering Faculty Of Engineering

• SEKI Hikaru

  Department of Biotechnology, Graduate School of Engineering, Osaka University

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著作論文

• Solid-Phase Reactions of Diffusion Barriers of Ti and TiN to Copper Layers on SiO_2
• Transmissin Electron Microscopy Observation of Polymorphic Epitaxial Growth of YSi_ Layer in Al(001)/YSi_/Si(001) Systems
• Thermal Stability of W_2N Film as a Diffusion Barrier between Al and Si
• Oxidation Behavior of Ta Thin Films as a Passivation Layer Deposited on Cu
• Oxidation Characteristics of Al–Ta Thin Alloy Films as a Passivation Layer on Cu
• Effects of Al3Ta/TaN Bilayered Diffusion Barriers in the Al/Si Contact Systems
• Auger Electron Spectroscopy Study on the Stability and the Interfacial Reaction of Ta, Ta-N arnd TaN Films as a Diffusion Barrier between Cu_9Al_4 Film and Si
• Characterizations and Barrier Properties of WN_x Film in the Al_W/WN_x/Si Contact System

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