Takeyama Mayumi | Department Of Electrical And Electronic Engineering Faculty Of Engineering Kitami Institute Of Techn
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概要
- TAKEYAMA Mayumi B.の詳細を見る
- 同名の論文著者
- Department Of Electrical And Electronic Engineering Faculty Of Engineering Kitami Institute Of Technの論文著者
関連著者
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Takeyama Mayumi
Department Of Electrical And Electronic Engineering Faculty Of Engineering Kitami Institute Of Techn
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Noya Atsushi
Department Of Electrical And Electronic Engineering Faculty Of Engineering Kitami Institute Of Techn
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TAKEYAMA Mayumi
Department of Electrical and Electronic Engineering, Faculty of Engineering, Kitami Institute of Tec
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NOYA Atsushi
Department of Electrical and Electronic Engineering, Faculty of Engineering, Kitami Institute of Tec
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Aoyagi Eiji
Institute For Materials Research Tohoku University
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小間 篤
Department Of Chemistry The University Of Tokyo
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Maniruzzaman Md.
Department Of Electrical And Electronic Engineering Faculty Of Engineering Kitami Institute Of Techn
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Takeyama M
Kitami Inst. Technol. Kitami Jpn
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Sasaki Katsutaka
Department Of Electrical And Electronic Engineering Faculty Of Engineering Kitami Institute Of Techn
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Sato Masaru
Department Of Applied Chemistry School Of Advanced Science And Engineering Faculty Of Science And En
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Hayasaka Yuichiro
Institute For Materials Research Tohoku University
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Takeyama Mayumi
Department Of Electrical And Electronic Engineering Faculty Of Engineering Kitami Institute Of Techn
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AOYAGI Eiji
Institute for Materials Research, Tohoku University
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HIRAGA Kenji
Institute for Materials Research, Tohoku University
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Sato Masaru
Department of Oral Pathology, Asahi University School of Dentistry
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Hiraga K
Institute For Materials Research Tohoku University
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Hiraga Kenji
Institute For Materials Research
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OHSUNA Tetu
Institute for Materials Research, Tohoku University
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Ohsuna Tetu
Institute For Materials Research Tohoku University
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Aoyagi E
Tohoku Univ. Sendai Jpn
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Ichikawa T
Fdk Corp. Shizuoka Jpn
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Ichikawa Takaaki
Department Of Applied Physics Okayama University Of Science
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Sato Masaru
Department Of Electrical And Electronic Engineering Faculty Of Engineering Kitami Institute Of Techn
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Noya Atsushi
Institute for Materials Research, Tohoku University
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Aoyagi Eiji
Institute for Materials Research, Tohoku University, Sendai 980-8577, Japan
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HASEGAWA Hideki
Research Center for Integrated Quantum Electronics (RCIQE), Hokkaido University
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Seki H
Ibm Almaden Res. Center Ca Usa
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Seki Hikaru
Department Of Electrical And Electronic Engineering Faculty Of Engineering Kitami Institute Of Techn
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SASAKI Katsutaka
Department of Materials Science, Kitami Institute of Technology
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SAKANISHI Kouichirou
Department of Electrical and Electronic Engineering, Faculty of Engineering, Kitami Institute of Tec
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Ito Shun
Institute For Materials Research Tohoku University
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Itoi Takaomi
Department Of Electronics And Mechanics Engineering Chiba University
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FUKUDA Tomoyuki
Department of Electrical and Electronic Engineering, Faculty of Engineering, Kitami Institute of Tec
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Taguchi Masahiro
Department Of Molecular Biotechnology Graduate School Of Advanced Sciences Of Matter Hiroshima Unive
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Hashizume Tamotsu
Research Center For Integrated Quantum Electronics (rciqe) And Graduate School Of Information Scienc
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Noya Atsushi
Department Of Electrical And Electronic Engineering Faculty Of Engineering Kitami Institute Of Techn
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Noya Atsushi
Department Of Electrical And Electronic Engineering Faculty Of Engineering Kitami Institute Of Techn
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Noya Atsushi
Department Of Electrical And Electronic Engineering Faculty Of Engineering Kitami Institute Of Techn
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Noya Atsushi
Department Of Electrical And Electronic Engineering Faculty Of Engineering Kitami Institute Of Techn
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Takeyama Mayumi
Department Of Electrical And Electronic Engineering Faculty Of Engineering Kitami Institute Of Techn
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Takeyama Mayumi
Department Of Electrical And Electronic Engineering Faculty Of Engineering Kitami Institute Of Techn
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Takeyama Mayumi
Department Of Electrical And Electronic Engineering Faculty Of Engineering Kitami Institute Of Techn
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Takeyama Mayumi
Department Of Electrical And Electronic Engineering Faculty Of Engineering Kitami Institute Of Techn
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Takeyama Mayumi
Department Of Electrical And Electronic Engineering Faculty Of Engineering Kitami Institute Of Techn
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Sakanishi Kouichirou
Department Of Electrical And Electronic Engineering Faculty Of Engineering Kitami Institute Of Techn
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Fukuda Tomoyuki
Department Of Biophysics Graduate School Of Science Kyoto University
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Fukuda Tomoyuki
Department Of Electrical And Electronic Engineering Faculty Of Engineering Kitami Institute Of Techn
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Taguchi Masahiro
Department Of Electrical And Electronic Engineering Faculty Of Engineering
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Hasegawa Hideki
Research Center for Integrated Quantum Electronics (RCIQE) and Graduate School of Information Science and Technology, Hokkaido University, North 13, West 8, Kita-ku, Sapporo 060-8628, Japan
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Takaomi Itoi
Department of Electrical and Electronic Engineering, Faculty of Engineering, Kitami Institute of Technology, Kitami, Hokkaido 090-8507, Japan
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Atsushi Noya
Department of Electrical and Electronic Engineering, Faculty of Engineering, Kitami Institute of Technology, Kitami, Hokkaido 090-8507, Japan
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Takeyama Mayumi
Department of Electrical and Electronic Engineering, Faculty of Engineering, Kitami Institute of Technology, Kitami, Hokkaido 090-8507, Japan
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Mayumi B.
Department of Electrical and Electronic Engineering, Faculty of Engineering, Kitami Institute of Technology, Kitami, Hokkaido 090-8507, Japan
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Sato Masaru
Department of Electrical and Electronic Engineering, Faculty of Engineering, Kitami Institute of Technology, Kitami, Hokkaido 090-8507, Japan
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Hayasaka Yuichiro
Institute for Materials Research, Tohoku University, Sendai 980-8577, Japan
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SEKI Hikaru
Department of Biotechnology, Graduate School of Engineering, Osaka University
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Sudoh Hiroshi
Gas-Phase Growth Ltd., Koganei, Tokyo 184-0012, Japan
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Machida Hideaki
Gas-Phase Growth Ltd., Koganei, Tokyo 184-0012, Japan
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Hayasaka Yuichirou
Institute for Materials Research, Tohoku University, Sendai 980-8577, Japan
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Takeyama Mayumi
Department of Electrical and Electronic Engineering, Faculty of Engineering, Kitami Institute of Technology, Kitami, Hokkaido 090-8507, Japan.
著作論文
- Solid-Phase Reactions of Diffusion Barriers of Ti and TiN to Copper Layers on SiO_2
- Evaluation of [111]-Textured Cu Layer Formed on Thin Nb Barrier Layer on SiO_2(Session 8A Silicon Devices V,AWAD2006)
- Evaluation of [111]-Textured Cu Layer Formed on Thin Nb Barrier Layer on SiO_2(Session 8A Silicon Devices V)
- Formation of Preferentially Oriented Cu [111] Layer on Nb [110] Barrier on SiO_2
- Structural Analyses of Cu[111] Layer on Nb[110] Barrier Formed on SiO_2(AWAD2003 : Asia-Pacific Workshop on Fundamental and Application of Advanced Semiconductor Devices)
- Structural Analyses of Cu[111] Layer on Nb[110] Barrier Formed on SiO_2 (AWAD2003 (Asia-Pacific Workshop on Fundamental and Application of Advanced Semiconductor Devices))
- Formation of [111] Preferentially Oriented Cu Layer on [110] Nb Barrier on SiO_2
- Formation of [111] Preferentially Oriented Cu Layer on [110] Nb Barrier on SiO_2
- Thermal Stability of W_2N Compound Barrier in W/W_2N/poly-Si Gate Electrode Configuration(Electronic Materials)
- Effectiveness of Al_W Layer on Suppression of Spontaneous Reaction in Al/Al_W/W_2N/Si Contact Systems
- Solid-Phase Reactions in Polymorphic Epitaxial Contact Systems of Al/YSi_/Si
- Preparation of WN_x Films and Their Diffusion Barrier Properties in Cu/Si Contact Systems
- Thermal Stability of W_2N Compound Barrier in W/W_2N/poly-Si Gate Electrode Configuration
- Transmissin Electron Microscopy Observation of Polymorphic Epitaxial Growth of YSi_ Layer in Al(001)/YSi_/Si(001) Systems
- Thermal Stability of W_2N Film as a Diffusion Barrier between Al and Si
- Oxidation Behavior of Ta Thin Films as a Passivation Layer Deposited on Cu
- Oxidation Characteristics of Al–Ta Thin Alloy Films as a Passivation Layer on Cu
- Interfacial Reaction and Electrical Properties in the Sputter-Deposited Al/Ti Ohmic Contact to n-InP
- Effects of Al3Ta/TaN Bilayered Diffusion Barriers in the Al/Si Contact Systems
- Auger Electron Spectroscopy Study on the Stability and the Interfacial Reaction of Ta, Ta-N arnd TaN Films as a Diffusion Barrier between Cu_9Al_4 Film and Si
- Characterizations and Barrier Properties of WN_x Film in the Al_W/WN_x/Si Contact System
- Barrier Properties of Thin ZrNx Films Prepared by Radical-Assisted Surface Reaction
- Atomic Layer Deposition of Thin VNx Film from Tetrakis(diethylamido)vanadium Precursor
- Oxidation Characteristics of Thin Al--Mo Alloy Films with Various Compositions as Metal Capping Layer on Cu
- Application of Extremely Thin ZrN Film as Diffusion Barrier between Cu and SiOC
- Reactively Sputtered Nanocrystalline ZrN Film as Extremely Thin Diffusion Barrier between Cu and SiO2
- Preferentially Oriented Cu[111] Layer Formed on Thin Nb Barrier on SiO2
- Evolution of Microstructures in Nanocrystalline VN Barrier Leading to Failure in Cu/VN/SiO2/Si Systems
- Characterization of silicon nitride thin films deposited by reactive sputtering and plasma-enhanced CVD at low temperatures
- Characterization of TiHfN ternary alloy films as a barrier between Cu plug and Si
- Preparation of nanocrystalline HfN