OHSUNA Tetu | Institute for Materials Research, Tohoku University
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概要
関連著者
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小間 篤
Department Of Chemistry The University Of Tokyo
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TAKEYAMA Mayumi
Department of Electrical and Electronic Engineering, Faculty of Engineering, Kitami Institute of Tec
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NOYA Atsushi
Department of Electrical and Electronic Engineering, Faculty of Engineering, Kitami Institute of Tec
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Maniruzzaman Md.
Department Of Electrical And Electronic Engineering Faculty Of Engineering Kitami Institute Of Techn
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Hayasaka Yuichiro
Institute For Materials Research Tohoku University
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Noya Atsushi
Department Of Electrical And Electronic Engineering Faculty Of Engineering Kitami Institute Of Techn
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AOYAGI Eiji
Institute for Materials Research, Tohoku University
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OHSUNA Tetu
Institute for Materials Research, Tohoku University
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Ohsuna Tetu
Institute For Materials Research Tohoku University
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Takeyama Mayumi
Department Of Electrical And Electronic Engineering Faculty Of Engineering Kitami Institute Of Techn
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Aoyagi Eiji
Institute For Materials Research Tohoku University
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Takeyama Mayumi
Department Of Electrical And Electronic Engineering Faculty Of Engineering Kitami Institute Of Techn
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Noya Atsushi
Institute for Materials Research, Tohoku University
著作論文
- Structural Analyses of Cu[111] Layer on Nb[110] Barrier Formed on SiO_2(AWAD2003 : Asia-Pacific Workshop on Fundamental and Application of Advanced Semiconductor Devices)
- Structural Analyses of Cu[111] Layer on Nb[110] Barrier Formed on SiO_2 (AWAD2003 (Asia-Pacific Workshop on Fundamental and Application of Advanced Semiconductor Devices))