Effects of Sputtering Gas Pressure on Electrochromic Properties of Ni Oxyhydroxide Thin Films Prepared by Reactive Sputtering in H2O Atmosphere
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概要
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Ni oxyhydroxide (NiOOH) thin films were prepared by reactive sputtering in an atmosphere of H2O gas, and the effects of sputtering gas pressure on their electrochromic properties in KOH aqueous electrolyte were studied. The largest optical density change was obtained for the thin films deposited under high sputtering gas pressures of approximately 6.7 Pa because of their low film density and chemical composition close to NiOOH. Stable transmittance change during coloring and bleaching cycles was obtained for the film from the first cycle up to 100 cycles.
- 2010-11-25
著者
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Obata Takeshi
Department Of Chemistry Graduate School Of Science Tohoku University
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Sasaki Katsutaka
Department Of Electrical And Electronic Engineering Faculty Of Engineering Kitami Institute Of Techn
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Itoh Hidenobu
Department Of Materials Science And Engineering Kitami Institute Of Technology
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Abe Yoshio
Department of Materials Science and Engineering, Faculty of Engineering, Kitami Institute of Technology, 165 Koen-cho, Kitami, Hokkaido 090-8507, Japan
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Itoh Hidenobu
Department of Materials Science and Engineering, Kitami Institute of Technology, Kitami, Hokkaido 090-8507, Japan
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Ueta Hideaki
Department of Materials Science and Engineering, Kitami Institute of Technology, Kitami, Hokkaido 090-8507, Japan
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Kawamura Midori
Department of Materials Science and Engineering, Kitami Institute of Technology, Kitami, Hokkaido 090-8507, Japan
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Obata Takeshi
Department of Materials Science and Engineering, Kitami Institute of Technology, Kitami, Hokkaido 090-8507, Japan
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