Preparation of Single-Oriented (111)VN Film with Low-Resistivity and Its Application as Diffusion Barrier between Cu and Si
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概要
- 論文の詳細を見る
We have investigated the optimum conditions for preparing single-oriented (111)VN film with low-resistivity by reactive sputtering and prepared a Cu/VN/Si contact system to apply the (111)VN film as a diffusion barrier used in the Cu metallization technology of Si-LSI. Then, influences of various sputtering conditions on the film quality of VN were investigated, and the thermal stability of the contact system was evaluated by X-ray diffraction (XRD) and Auger electron spectroscopy (AES) analyses. As a result, it is revealed that a nearly stoichiometric single-oriented (111)VN film with a resistivity of 57 μ$\Omega$ cm can be prepared under the optimum sputtering conditions, and the Cu/VN/Si contact system is satisfactorily stable up to 700°C, even when the thickness of the VN diffusion barrier is reduced to 30 nm.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2006-01-15
著者
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Shinkai Satoko
Department Of Materials Science Faculty Of Engineering Kitami Institute Of Technology
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Sasaki Katsutaka
Department Of Electrical And Electronic Engineering Faculty Of Engineering Kitami Institute Of Techn
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Yanagisawa Hideto
Department Of Electrical And Electronic Engineering Kitami Institute Of Technology
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Yoshimoto Ken-ichi
Department Of Electrical Engineering Asahikawa National College Of Technology
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Kaiya Fumihiro
Department of Electrical and Computer Engineering, Asahikawa National College of Technology, 2-2 Shunkodai, Asahikawa, Hokkaido 071-8142, Japan
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Shinkai Satoko
Department of Control Engineering, Takuma National College of Technology, 551 Koda, Takuma-cho, Kagawa 769-1192, Japan
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Shinkai Satoko
Department of Control Engineering, Takuma National College of Technology, 551 Kohda, Takuma-cho, Kagawa 769-1192, Japan
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Yoshimoto Ken-ichi
Department of Electrical and Computer Engineering, Asahikawa National College of Technology, 2-2 Shunkodai, Asahikawa, Hokkaido 071-8142, Japan
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