Loss Properties of Anodized Thin-Film Capacitors Fabricated Using Hf-Doped Nb Alloy Films
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概要
- 論文の詳細を見る
To improve the loss properties of Nb anodized thin-film capacitors, Nb–Hf alloy films and Nb–Hf anodized thin-film capacitors were prepared. As an example, various properties of a Nb–Hf (7 at. %) anodized thin-film capacitor with an oxide thickness of 160 nm were compared with those of pure-Nb. It was determined that the loss and leakage current properties of Nb anodized capacitors can be markedly improved by Hf doping while maintaining nearly the same capacitance density and relative permittivity. In addition, it was clarified that improvement in the loss properties of the Nb–Hf (7 at. %) anodized capacitor is due to the formation of a homogeneous complex oxide of Nb2O5 and HfO2 without lower oxides, as determined by depth analysis by Auger electron spectroscopy.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2009-08-25
著者
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Sasaki Katsutaka
Department Of Electrical And Electronic Engineering Faculty Of Engineering Kitami Institute Of Techn
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Yanagisawa Hideto
Department Of Electrical And Electronic Engineering Kitami Institute Of Technology
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Abe Yoshio
Department of Materials Science and Engineering, Faculty of Engineering, Kitami Institute of Technology, 165 Koen-cho, Kitami, Hokkaido 090-8507, Japan
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Shinkai Satoko
Center for Microelectronic System, Kyusyu Institute of Technology, 680-4 Kawazu, Iizuka, Fukuoka 820-8502, Japan
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Yamane Misao
Department of Materials Science, Faculty of Engineering, Kitami Institute of Technology, 165 Koen-cho, Kitami, Hokkaido 090-8507, Japan
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Yamane Misao
Department of Materials Science and Engineering, Faculty of Engineering, Kitami Institute of Technology, 165 Koen-cho, Kitami, Hokkaido 090-8507, Japan
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Shibata Tomoharu
Department of Materials Science, Faculty of Engineering, Kitami Institute of Technology, 165 Koen-cho, Kitami, Hokkaido 090-8507, Japan
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Kimizaki Hidefumi
Department of Materials Science, Faculty of Engineering, Kitami Institute of Technology, 165 Koen-cho, Kitami, Hokkaido 090-8507, Japan
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Shinkai Satoko
Center for Microelectronic System, Kyushu Institute of Technology, 680-4 Kawazu, Iizuka, Fukuoka 820-8502, Japan
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Kimizaki Hidefumi
Department of Materials Science and Engineering, Faculty of Engineering, Kitami Institute of Technology, 165 Koen-cho, Kitami, Hokkaido 090-8507, Japan
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