Improvement of the Electrical Properties of β-FeSi_2 Films on Si(001)by High-Temperature Annealing
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 2000-03-15
著者
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末益 崇
筑波大学大学院数理物質科学研究科電子・物理工学専攻
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TAKAKURA Ken-ichiro
Institute of Applied Physics, University of Tsukuba
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SUEMASU Takashi
Institute of Applied Physics, University of Tsukuba
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HASEGAWA Fumio
Institute of Applied Physics, University of Tsukuba
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HIROI Noriyoshi
Institute of Applied Physics, University of Tsukuba
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HASEGAWA Fumio
Tohoku University of Art and Design
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Hasegawa Fumio
Institute Of Applied Physics University Of Tsukuba
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Hiroi Noriyoshi
Institute Of Applied Physics University Of Tsukuba
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Suemasu Takashi
Institute Of Applied Physics University Of Tsukuba
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Takakura K
Institute Of Applied Physics University Of Tsukuba
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SUEMASU Takashi
Institlite of Materials Science, University of Tsukuba
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HASEGAWA Fumio
Institlite of Materials Science, University of Tsukuba
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