HASEGAWA Fumio | Tohoku University of Art and Design
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概要
関連著者
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HASEGAWA Fumio
Tohoku University of Art and Design
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Hasegawa Fumio
Institute Of Applied Physics University Of Tsukuba
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HASEGAWA Fumio
Institute of Applied Physics, University of Tsukuba
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SUEMASU Takashi
Institute of Applied Physics, University of Tsukuba
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Suemasu Takashi
Institute Of Applied Physics University Of Tsukuba
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末益 崇
筑波大学大学院数理物質科学研究科電子・物理工学専攻
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Nannichi Yasuo
Institute of Materials Science, University of Tsukuba
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Nannichi Yasuo
Institute Of Materials Science And Center For Tara Tsukuba Advanced Research Alliance University Of
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Nannichi Yasuo
University Of Tsukuba
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Nannichi Yasuo
Institute Of Materials Science Institute Of Applied Physics University Of Tsukuba
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Takakura K
Institute Of Applied Physics University Of Tsukuba
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Kumagai Y
Department Of Electrical And Information Engineering Faculty Of Engineering Yamagata University
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KOBAYASHI RYUJI
Institute of Health Sciences, Faculty of Medicine, Hiroshima University
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Kumagai Y
Hitachi Ltd. Ibaraki Jpn
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Kumagai Yoshinao
Institute Of Materials Science University Of Tsukuba
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Kobayashi Ryuji
Institute Of Materials Science University Of Tsukuba
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Fujii Toru
General R&d Lab. Taiyo Yuden Co. Ltd.
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FUJII Takashi
Central Research Institute of Electric Power Industry
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Fujii T
Toyohashi Univ. Technol. Toyohashi Jpn
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Fujii Tetsuo
Institute of Applied Physics, University of Tsukuba
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Fujii Toshio
Fujitsu Laboratories Lid.
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Fujii Toshio
Fujitsu Laboratories Limited
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Fujii T
Central Research Institute Of Electric Power Industry
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Fujii Takashi
Exploratory Research Laboratories Fujisawa Pharmaceutical Co. Ltd.
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HIROI Noriyoshi
Institute of Applied Physics, University of Tsukuba
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Ito Manabu
Tao Yamagata Video Archive Research Center
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KANAYA Hiroyuki
Institute of Material Science, University of Tsukuba
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YAMAKA Eiso
Tsukuba College of Technology
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Hiroi Noriyoshi
Institute Of Applied Physics University Of Tsukuba
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Kanaya H
Institute Of Materials Science University Of Tsukuba
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Fujii Kunihiro
Institute of Materials Science, University of Tsukuba
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Kanaya H
Toshiba Corp. Yokohama Jpn
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Yamamoto N
Sharp Corp. Nara Jpn
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Kawabe Mitsuo
Institute Of Materials Science University Of Tsukuba
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Kawabe Mitsuo
Institute Of Applied Physics University Of Tsukuba
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Minami Masato
The Authors Are With The Institute Of Applied Physics University Of Tsukuba
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Minami M
Department Of Microbiology Kyoto Prefectural University Of Medicine
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Minami Masato
Wildlife Research Center
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TAKAKURA Ken-ichiro
Institute of Applied Physics, University of Tsukuba
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Hashimoto S
Texas Instruments Tsukuba R & D Center Ltd. Ibaraki Jpn
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HASHIMOTO Satoshi
Texas Instruments Tsukuba Research and Development Center, Limited
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ISHIMOTO Kouichi
Institute of Materials Science, University of Tsukuba
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ISHIBASHI Youichi
TAO Yamagata Video Archive Research Center
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Kogure Takuyo
TAO Yamagata Video Archive Research Center
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Hashimoto S
Texas Instruments Tsukuba Res. And Dev. Center Ltd. Ibaraki Jpn
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Tsuchiya H
Toshiba Corp. Kawasaki Jpn
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TSUCHIYA Harutoshi
Institute of Materials Science, University of Tsukuba
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Iwata Naotaka
Institute Of Material Science University Of Tsukuba:(present Address)basic Research Laboratory Nippo
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Tanno Yoshikazu
Yamagata Video Archive Research Center Telecommunications Advancement Organization
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YAMAMOTO Norio
Institute of Materials Science, University of Tsukuba
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Narahara Satoru
Institute Of Materials Science University Of Tsukuba
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Tsuchiya Harutoshi
Institute Of Materials Science University Of Tsukuba
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ISHIKAWA Katsumi
Institute of Materials Science, University of Tsukuba
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Ishimoto Kouichi
Institute Of Materials Science University Of Tsukuba:(present Address) Ibm Japan Ltd.
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Hashimoto Satoshi
Texas Instruments Tsukuba Research And Development Center Limited
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Kubo K
Research And Development Center Toshiba Corporation
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Tanaka M
Production Engineering Research Laboratory Hitachi Ltd.
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Tanaka M
Mitsubishi Electric Co. Ltd. Hyogo Jpn
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Kawabe M
Nikko Materials Co. Ltd. Saitama Jpn
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Tanaka Michiko
Tokyo University Of Agiculture And Technology Department Of Biotechnology
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Tsuchiya Hajime
Department Of Polymer Science And Engineering Faculty Of Textile Science Kyoto Institute Of Technolo
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Tanaka M
New Materials Research Center Sanyo Electric Co. Ltd.
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OKUMURA Hajime
Electrotechnical Laboratory (ETL)
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Okumura H
National Institute Of Advanced Industrial Science And Technology Power Electronics Research Center
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Okumura H
Electrotechnical Lab. Ibaraki Jpn
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Okumura Hajime
Nakano Central Research Institute Nakano Vinegar Co. Ltd.
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Okumura Hajime
Electrotechnical Laboratory
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Mori Ryosuke
Institute Of Materials Science University Of Tsukuba
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JIN Yoshito
NTT LSI Laboratories
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PARK Kang-Ho
Basic Research Laboratory, Electronics and Telecommunications Research Institute
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Tanaka M
Manufacturing Development Center Mitsubishi Electric Corporation
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INOMATA Yuya
Institute of Applied Physics, University of Tsukuba
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Inomata Yuya
Institute Of Applied Physics University Of Tsukuba
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YOSHIDA Sadafumi
Electrotechnical Laboratory
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Park Kang-ho
Basic Research Laboratory. Electronics And Telecommunications Research Institute. Yu-song P.o.
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Park Kang-ho
Telecommunication Basic Research Laboratory
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Park Kang-ho
Basic Research Laboratory Electronics And Telecommunications Research Institute
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Koukitu Akinori
Department Of Applied Chemistry Faculty Of Technology Tokyo University Of Agriculture And Technology
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Tanaka M
Toshiba Corp. Kawasaki Jpn
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TANAKA Masaya
Institute of Materials Science, University of Tsukuba
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PARK Kyung-ho
Texas Instruments Tsukuba Research & Development Center Ltd.
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Tanaka Masaya
Institute Of Materials Science University Of Tsukuba
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Takahashi Teruo
Department Of Organic And Polymeric Materials Tokyo Institute Of Technology
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Takahashi Tetsuo
National Institute Of Advanced Industrial Science And Technology Power Electronics Research Center
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Taguchi Tomohiro
Department Of Organic Materials Tokyo Institute Of Technology
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KUBO Kohji
Department of Applied Physics, School of Science and Engineering, Waseda University
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Seki H
Department Of Applied Chemistry Faculty Of Technology Tokyo University Of Agriculture And Technology
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Tanaka M
Institute Of Multidisciplinary Research For Advanced Materials Tohoku University
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TANNO Yoshikazu
Yamagata Digital Content Center for Research and Promotion
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Hiki Haruo
TAO Yamagata Video Archive Research Center
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SUNABA Kenji
Institute of Materials Science, University of Tsukuba
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MINAMI Masato
Institute of Materials Science, University of Tsukuba
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Park K‐h
Basic Research Laboratory. Electronics And Telecommunications Research Institute. Yu-song P.o.
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Mori R
Nagaoka Univ. Technol. Nagaoka Jpn
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Kawabe M
Institute Of Applied Physics University Of Tsukuba
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Kubo K
Univ. Tsukuba Ibaraki Jpn
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Yoshida S
The Second Department Of Internal Medicine Chiba University School Of Medicine
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Jin Y
Ntt Microsystem Integration Laboratories
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Seki Hisashi
Department Of Applied Chemistry Faculty Of Technology Tokyo University Of Agriculture And Technology
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Maehara Fumio
Telecommunication Advancement Organization Yamagata Video Archive Research Center
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Park Kyung-ho
Texas Instruments Inc.
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Takahashi T
Japan Advanced Institute Of Science And Technology
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Okunuma H
National Institute Of Advanced Industrial Science And Technology
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Yamaguchi H
Matsushita Electric Industrial Co. Ltd. Osaka Jpn
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TOMOZANE Mamoru
Institute of Materials Science, University of Tsukuba
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Tomozane M
Motorola Inc. Az Usa
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Tomozane Mamoru
Institute Of Materials Science University Of Tsukuba
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Tomozane Mamoru
Institute Of Materials Science University Of Tsukuba:(present Address) Motrola -japan
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IIKURA Yusuke
Institute of Applied Physics, University of Tsukuba
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Yamaguchi H
Ntt Basic Research Laboratories
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Iikura Yusuke
Institute Of Applied Physics University Of Tsukuba
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Taino M
Institute Of Multidisciplinary Research For Advanced Materials Tohoku University
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Inomata Y
Institute Of Applied Physics University Of Tsukuba
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JIN Yoshito
Institute of Materials Science, University of Tsukuba
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YAMAGUCHI Hiromu
Institute of Materials Science, University of Tsukuba
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TAKAHASHI Tsuyoshi
Institute of Materials Science, University of Tsukuba
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KUBO Kiyokazu
Institute of Materials Science, University of Tsukuba
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Sunaba Kenji
Institute Of Applied Physics University Of Tsukuba
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Matsuzaki T
Department Of Applied Chemistry Faculty Of Engineering Himeji Institute Of Technology
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Yoshida S
Sharp Corp. Nara Jpn
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Yamaguchi Hiromu
Institute Of Materials Science Universityof Tsukuba
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南 正人
麻布大
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南 正人
NPO法人ピッキオ
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ARAI Toshihiro
Institute of Applied Physics, The University of Tsukuba
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Ikura Yoshihiro
Institute Of Applied Physics University Of Tsukuba
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KOUKITU Akinori
Department of Applied Chemistry, Tokyo University of Agriculture and Technology
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SHIGEKAWA Hidemi
Institute of Applied Physics, University of Tsukuba
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南 正人
Picchio/星野ワイルドライフリサーチセンター
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Seki Naoki
Institute Of Applied Physics University Of Tsukuba
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Yasuda Hiroshi
The University Of Tokyo
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Yasuda Hiroshi
The University Of Tokyo Rcast
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Onomura Masaaki
Institute Of Materials Science University Of Tsukuba
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Aoki Terumasa
The University Of Tokyo
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MATSUURA Nobuyuki
Institute of Materials Science, University of Tsukuba
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NAKAMURA Tomoyuki
Institute of Applied Physics, University of Tsukuba
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IZAWA Takamasa
Institute of Applied Physics, University of Tsukuba
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SEKI Hisashi
Department of Applied Chemistry, Tokyo University of Agriculture and Technology
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Izawa Takamasa
Institute Of Applied Physics University Of Tsukuba
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KUMAGAI Yoshinao
Texas Instruments Tsukuba Research and Development Center Limited
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YAMAMOTO Masaki
Institute of Materials Science, University of Tsukuba
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TEE Keh-Ming
Institute of Materials Science, University of Tsukuba
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ISHIBASHI Takayuki
Institute of Materials Science, University of Tsukuba
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Yasuda H
The University Of Tokyo
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Ishibashi Takayuki
Institute Of Materials Science University Of Tsukuba
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Ishibashi Takayuki
Institute Of Materials Science University Of Tsukuba:(present Address) Faculty Of Technology Tokyo U
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Hsu Chih-chang
Rcast The University Of Tokyo
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Nakamura Tomoyuki
Institute Of Applied Physics University Of Tsukuba
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HSU Chin-Chang
The University of Tokyo
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KOGURE Takuyo
Matsushita Electric Industrial Co., Ltd.
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MAEHARA Fumio
Panasonic AVC & Networks Company, Matsushita Electric Ind. Co., Ltd.
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FUJIMOTO Makoto
Panasonic System Solution Company, Matsushita Electric Ind. Co., Ltd.
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ITO Manabu
Osaka University
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Ishibashi Yoichi
Yamagata Video Archive Research Center, Telecommunications Advancement Organization
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Kogure Takuyo
Yamagata Video Archive Research Center, Telecommunications Advancement Organization
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Ito Manabu
Yamagata Video Archive Research Center, Telecommunications Advancement Organization
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Hasegawa Fumio
Yamagata Video Archive Research Center, Telecommunications Advancement Organization
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Hasegawa Fumio
Telecommunication Advancement Organization, Yamagata Video Archive Research Center
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Maehara Fumio
Telecommunication Advancement Organization, Yamagata Video Archive Research Center
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Kasabata Masaru
Telecommunication Advancement Organization, Yamagata Video Archive Research Center
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Hiki Haruo
Telecommunication Advancement Organization, Yamagata Video Archive Research Center
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Sekiya Satomi
Telecommunication Advancement Organization, Yamagata Video Archive Research Center
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Ito Manabu
Telecommunication Advancement Organization, Yamagata Video Archive Research Center
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Tanno Yoshikazu
Telecommunication Advancement Organization, Yamagata Video Archive Research Center
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OKAHISA Takuji
Institute of Materials Science, University of Tsukuba
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MATSUMOTO Hisashi
Institute of Materials Science, University of Tsukuba
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Shigekawa Hidemi
Institute Of Material Science University Of Tsukuba
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Shigekawa Hidemi
Institute Of Applied Physics And 21st Coe University Of Tsukuba
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CHO Yukiko
Institute of Materials Science, University of Tsukuba
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Tee Keh-ming
Institute Of Materials Science University Of Tsukuba
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南 正人
株式会社ピッキオ
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Kogure Takuyo
Matsushita Electric Industrial Co. Ltd. Multimedia Development Center Planning Standardization
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Sekiya Satomi
Telecommunication Advancement Organization Yamagata Video Archive Research Center
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Takayama Koji
Institute Of Materials Science University Of Tsukuba
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Okahisa Takuji
Institute Of Materials Science University Of Tsukuba
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Arai Toshihiro
Institute For Optical Research Kyoiku University
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IIKURA Yuusuke
Institute of Materials Science, University of Tsukuba
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Cho Yukiko
Institute Of Materials Science University Of Tsukuba
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MORIYAMA Takashi
National Space Development Agency of Japan
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NAKAJIMA Masakatsu
National Space Development Agency of Japan
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Kasabata Masaru
Telecommunication Advancement Organization Yamagata Video Archive Research Center
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Fujimoto Makoto
Panasonic System Solution Company Matsushita Electric Ind. Co. Ltd.
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Matsuura Nobuyuki
Institute Of Materials Science University Of Tsukuba
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ONODERA Isao
Institute of Materials Science, University of Tsukuba
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FUKASE Tadashi
Institute of Materials Science, University of Tsukuba
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OHNARI Seinosuke
Institute of Materials Science, Institute of Applied Physics, University of Tsukuba
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SHIMIZU Norisato
Institute of Materials Science, University of Tsukuba
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YAMATE Tsutomu
Institute of Materials Science, University of Tsukuba
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YAMAMOTO Tadashi
Institute of Materials Science, University of Tsukuba
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HASEGAWA Fumio
The authors are with the Institute of Applied Physics, University of Tsukuba
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SUEMASU Takashi
The authors are with the Institute of Applied Physics, University of Tsukuba
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Onodera Isao
Institute Of Materials Science University Of Tsukuba
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Fukase Tadashi
Institute Of Materials Science University Of Tsukuba
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Shimizu Norisato
Institute Of Materials Science University Of Tsukuba
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Yamate Tsutomu
Institute Of Materials Science University Of Tsukuba:nippon Schlumberger K. K. Optics Department
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Matsumoto Hisashi
Institute Of Materials Science University Of Tsukuba
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Arai Toshihiro
Institute Of Materials Science Institute Of Applied Physics University Of Tsukuba
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Ohnari Seinosuke
Institute Of Materials Science Institute Of Applied Physics University Of Tsukuba
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Arai Toshihiro
Institte For Optical Research Kyoiku University
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Yasuda Hiroshi
The United Graduate School Of Agricultural Sciences Iwate Univ.
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Yamamoto Tadashi
Institute Of Materials Science University Of Tsukuba
著作論文
- Control of the Conduction Type of Nondoped High Mobility β-FeSi_2 Films Grown from Si/Fe Multilayers by Change of Si/Fe Ratios
- Si Molecular Beam Epitaxial Growth over an Atomic-Layer Boron Adsorbed Si(001) Substrate and Its Electrical Properties
- Epitaxial Growth of Semiconducting BaSi_2 Thin Films on Si(111) Substrates by Reactive Deposition Epitaxy
- Epitaxial Growth of Si-Based Ternary Alloy Semiconductor Ba_Sr_xSi_2 Films on Si(111) Substrates by Molecular Beam Epitaxy
- Direct Growth of [100]-Oriented High-Quality β-FeSi_2 Films on Si(001) Substrates by Molecular Beam Epitaxy(Semiconductors)
- Donor and Acceptor Levels in Undoped β-FeSi_2 Films Grown on Si (001) Substrates : Semiconductors
- Improvement of the Electrical Properties of β-FeSi_2 Films on Si(001)by High-Temperature Annealing
- Growth of Continuous and Highly (100)-Oriented β-FeSi_2 Films on Si(001) from Si/Fe Multilayers with SiO_2 Capping and Templates
- Aggregation of Monocrystalline β-FeSi_2 by Annealing and by Si Overlayer Growth
- 4-Monolayer-Height Layer-by-Layer Growth and Increase of the Critical Thickness of Ge Heteroepitaxy on Boron-Preadsorbed Si(111) Surface
- Comparison of Planar to Columnar Transformation of PtSi Layers on Si(001) and Si(111) Substrates in the Si Capping Layer Growth Process
- Growth Temperature Dependence of Boron Surface Segregation and Electrical Properties of Boron Delta-Doped Structures Grown by Si Molecular Beam Epitaxy
- M-10 An Adaptive Scheduling Algorithm for On-Demand Video Delivery System
- Mpeg-7メタデータフォーマットに基づく大規模映像アーカイブ・配信システム : 教育システム
- Verification Tests Approach Based on "MPEG-7 over Content ID" for the Large Scale Digital Archive
- Development of Content Retrieval Application Using MPEG-7 for Archive Video Materials
- BROADCASTING PROGRAM PRODUCTION SYSTEM BY USING PETA-BYTE CLASS LARGE SCALE ARCHIVE
- Influence of As Autodoping from GaAs Substrates on Thick Cubic GaN Growth by Halide Vapor Phase Epitaxy
- Comparison of Hydride Vapor Phase Epitaxy of GaN Layers on Cubic GaN/(100)GaAs and Hexagonal GaN/(111)GaAs Substrates
- Homoepitaxial Growth of Cubic GaN by Hydride Vapor Phase Epitaxy on Cubic GaN/GaAs Substrates Prepared with Gas Source Molecular Beam Epitaxy
- Dependence of the Carrier Concentration Profile at the Si MBE Layer/p-Si Substrate Interface on the Si Substrate Preparation Method
- Magnetotransport Properties of a Single-Crystalline β-FeSi_2 Layer Grown on Si(001) Substrate by Reactive Deposition Epitaxy
- One Possibility of Obtaining Bulk GaN: Halide VPE Growth at 1000℃ on GaAs (111) Substrates(Special Issue on Blue Laser Diodes and Related Devices/Technologies)
- Thick and Smooth Hexagonal GaN Growth on GaAs (111) Substrates at 1000℃ with Halide Vapor Phase Epitaxy
- Improvement of 1.5 μm Photoluminescence from Reactive Deposition Epitaxy (RDE) Grown β-FeSi_2 Balls in Si by High Temperature Annealing
- Photoluminescence from Reactive Deposition Epitaxy (RDE) Grown β-FeSi_2 Balls Embedded in Si Crystals
- Low-Temperature Formation of the PtSi Layer by Codeposition of Pt and Si in a Molecular Beam Epitaxy System
- Preferential PtSi Formation in Thermal Reaction between Pt and Si_Ge_ MBE Layers
- Reduction of the Barrier Height of Silicide/p-Si_Ge_x Contact for Application in an Infrared Image Sensor
- Reflection High-Energy Electron Diffraction Intensity Oscillations during Si MBE Growth on HF-Treated Si(111) Surface
- Electron Traps due to Defect-Impurity Complexes Induced by the Deformation of Epitaxial GaAs Grown on Si-Doped Substrate
- Distribution of the Main Electron Trap EL2 in Undoped LEC GaAs
- Comparison of Deep Energy Levels in HB and LEC Undoped Bulk GaAs : LATE NEWS
- Relation between Cr-Level and Main Electron Trap (EL2)in Boat-Grown Bulk GaAs
- Atomic Layer Epitaxy of GaAs Using GaCl_3 and AsH_3
- Vapor Phase Epitaxy of AlGaAs by Direct Reacion between AlCl_2, GaCl_3 and AsH_3/H_2
- Analysis of Thermally Stimulated Current Spectroscopy in Semiinsulating GaAs. I. Initialization
- Plasma CVD of Amorphous AlN from Metalorganic Al Source and Properties of the Deposited Films
- Passivation Properties of Plasma CVD AlN Films for GaAs
- Disordering of Si-Doped AlAs/GaAs Superlattice by Annealing
- Photo-Annealing of Fatigue in Photoluminescence of Hydrogenated Amorphous Silicon
- Effects of Carrier Gas and Substrate on the Electrical Properties of Epitaxial GaAs Grown by the Single Flat Temperature Zone Chloride VPE Method
- Chloride VPE of Al_xGa_As by the Hydrogen Reduction Method Using a Metal Al Source : Semiconductors and Semiconductor Devices
- Thermodynamic Analysis on Vapor Phase Epitaxy of GaAs by GaCl_3 and AsH_3 System : Condensed Matter
- In Situ Observation of Atomic Layer Epitaxy of GaAs Using GaCl_3 by Surface Photo-Absorption Method
- Role of Hydrogen in Atomic Layer Epitaxy of GaAs Using GaCl_3
- Epitaxial Growth of GaAs at One to Two Monolayers per Cycle by Alternate Supply of GaCl_3 and AsH_3
- Etching of GaAs by Atomic Hydrogen Generated by a Tungsten Filament