Epitaxial Growth of Semiconducting BaSi_2 Thin Films on Si(111) Substrates by Reactive Deposition Epitaxy

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概要

• 論文の詳細を見る
• 2004-07-15

著者

• 末益 崇

  筑波大学大学院数理物質科学研究科電子・物理工学専攻

• SUEMASU Takashi

  Institute of Applied Physics, University of Tsukuba

• HASEGAWA Fumio

  Institute of Applied Physics, University of Tsukuba

• INOMATA Yuya

  Institute of Applied Physics, University of Tsukuba

• NAKAMURA Tomoyuki

  Institute of Applied Physics, University of Tsukuba

• Inomata Yuya

  Institute Of Applied Physics University Of Tsukuba

• Nakamura Tomoyuki

  Institute Of Applied Physics University Of Tsukuba

• HASEGAWA Fumio

  Tohoku University of Art and Design

• Hasegawa Fumio

  Institute Of Applied Physics University Of Tsukuba

• Suemasu Takashi

  Institute Of Applied Physics University Of Tsukuba

• Inomata Y

  Institute Of Applied Physics University Of Tsukuba

• SUEMASU Takashi

  Institlite of Materials Science, University of Tsukuba

• HASEGAWA Fumio

  Institlite of Materials Science, University of Tsukuba

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