Photoresponse Properties of Polycrystalline BaSi_2 Films Grown on SiO_2 Substrates Using (111)-Oriented Si Layers by an Aluminum-Induced Crystallization Method

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概要

• 論文の詳細を見る
• Japan Society of Applied Physicsの論文
• 2009-05-25

著者

• USAMI Noritaka

  Institute for Materials Research, Tokoku University

• Usami Noritaka

  Institute Of Materials Research Tohoku University

• Usami Noritaka

  Institute For Material Research Tohoku University

• SUEMASU Takashi

  Institute of Applied Physics, University of Tsukuba

• SAITO Takanobu

  Institute of Applied Physics, University of Tsukuba

• TSUKADA Dai

  Institute of Applied Physics, University of Tsukuba

• MATSUMOTO Yuta

  Institute of Applied Physics, University of Tsukuba

• SASAKI Ryo

  Institute of Applied Physics, University of Tsukuba

• TAKEISHI Michitoshi

  Institute of Applied Physics, University of Tsukuba

• Saito Takanobu

  Institute For Materials Research

• Suemasu Takashi

  Institute Of Applied Physics University Of Tsukuba

• Tsukada Dai

  Institute Of Applied Physics University Of Tsukuba

• Matsumoto Yuta

  Institute Of Applied Physics University Of Tsukuba

• Sasaki Ryo

  Institute Of Applied Physics University Of Tsukuba

• Saito Takanobu

  Institute Of Applied Physics University Of Tsukuba

• Takeishi Mitsutomo

  Institute Of Applied Physics University Of Tsukuba

• SUEMASU Takashi

  Institlite of Materials Science, University of Tsukuba

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