Luminescence from Strained Si_<1-x>Ge_x/Si Quantum Wells Grown by Si Molecular Beam Epitaxy
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1993-03-30
著者
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Usami N
Institute For Materials Research (imr) Tohoku University
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Usami Noritaka
Tohoku Univ. Miyagi Jpn
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SHIRAKI Yasuhiro
Research Center for Advanced Science and Technology (RCAST), The University of Tokyo
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Usami Noritaka
Institute For Material Research Tohoku University
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Usami Noritaka
Research Center For Advanced Science And Technology (rcast) The University Of Tokyo
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FUKATSU Susumu
Research Center for Advanced Science and Technology (RCAST), The University of Tokyo
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Fukatsu Shigeto
Department Of Applied Physics And Physico-informatics And Crest-jst Keio University
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Usami Noritaka
Institute For Materials Research (imr) Tohoku University
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Fukatsu S
Univ. Tokyo Tokyo Jpn
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Fukatsu Susumu
Research Center For Advanced Science And Technology (rcast) The University Of Tokyo:(present Address
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Shiraki Yasuhiro
Research Center For Advanced Science And Technology (rcast) The University Of Tokyo
関連論文
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- A Novel Triple δ-Doped SiGe Heterostructure Field-Effect Transistor
- Fabrication of Periodically Domain-Inverted AlGaAs Quasi-Phase-Matched Devices by GaAs/Ge/GaAs Sublattice Reversal Epitaxy
- Sublattice Reversal in GaAs/Si/GaAs (100) Heterostructures by Molecular Beam Epitaxy
- Preparation of a TiO-2 Film Coated Si Device for Photo-Decomposition of Water by CVD Method Using Ti(OPr^i)_4
- Strain Effects of Ge Islands on Si_Ge_x/Si Quantum Well
- Functional Enhancement of Metal-Semiconductor-Metal (MSM) Infrared Photodetectors on Heteroepitaxial SiGe-on-Si Using the Anodic Oxidation/Passivation Method
- High Sensitive Imaging of Atomic Arrangement of Ge Clusters Buried in a Si Crystal by X-ray Fluorescence Holography