Fabrication of SiGe-on-Insulator through Thermal Diffusion of Ge on Si-on-Insulator Substrate

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概要

• 論文の詳細を見る
• Japan Society of Applied Physicsの論文
• 2003-03-01

著者

• SAZAKI Gen

  Institute of Materials Science, Tohoku University

• USAMI Noritaka

  Institute for Materials Research, Tokoku University

• FUJIWARA Kozo

  Institute for Materials Research (IMR), Tohoku University

• NAKAJIMA Kazuo

  Institute for Materials Research (IMR), Tohoku University

• KUTSUKAKE Kentaro

  Institute for Materials Research (IMR), Tohoku University

• Ujihara Toru

  Institute For Materials Research Tohoku University

• Usami Noritaka

  Institute For Material Research Tohoku University

• Fujiwara Kozo

  Institute For Materials Research (imr) Tohoku University

• Fujiwara Kozo

  Institute For Materials Research Tohoku University

• ZHANG Baoping

  Photodynamics Research Center, The Institute of Physical and Chemical Research (RIKEN)

• Usami Noritaka

  Institute For Materials Research (imr) Tohoku University

• SEGAWA Yusaburou

  Photodynamics Research Center, The Institute of Physical and Chemical Research (RIKEN)

• Segawa Yusaburou

  Photodynamics Research Center The Institute Of Physical And Chemical Research (riken)

• Zhang Baoping

  Photodynamics Research Center The Institute Of Physical And Chemical Research (riken)

• Ujihara Toru

  Institute For Materials Research (imr) Tohoku University

• Sazaki Gen

  Institute For Materials Research (imr) Tohoku University

• Nakajima Kazuo

  Institute For Materials Research (imr) Tohoku University

• Kutsukake Kentaro

  Institute For Materials Research (imr) Tohoku University

• Nakajima Kazuo

  Institute for Materials Reseach, Tohoku University, 2-1-1 Katahira-cho, Aoba-ku, Sendai 980-8577, Japan

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