Thickness Dependence of Strain Field Distribution in SiGe Relaxed Buffer Layers
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概要
- 論文の詳細を見る
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2005-12-30
著者
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USAMI Noritaka
Institute for Materials Research, Tokoku University
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Usami Noritaka
Tohoku Univ. Miyagi Jpn
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NAKAGAWA Kiyokazu
Center for Crystal Science and Technology, University of Yamanashi
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SAWANO Kentarou
Research Center for Silicon Nano-Science, Advanced Research Laboratories, Tokyo City University
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SHIRAKI Yasuhiro
Research Center for Advanced Science and Technology (RCAST), The University of Tokyo
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ARIMOTO Keisuke
Center for Crystal Science and Technology, University of Yamanashi
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