Photoreflectance Study of Interface Roughness in Ge/SiGe Strained-Layer Heterostructures

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1994-04-30

著者

• Onabe Kentaro

  Department Of Applied Physics The University Of Tokyo

• Takemasa K

  Tokyo Inst. Technol. Yokohama Jpn

• ITO Ryoichi

  Department of Physics, Meiji University

• SHIRAKI Yasuhiro

  Research Center for Advanced Science and Technology (RCAST), The University of Tokyo

• YAGUCHI Hiroyuki

  Department of Applied Physics, The University of Tokyo

• Oki K

  Department Of Materials Science And Technology Graduate School Of Engineering Sciences Kyushu Univer

• TAI Kaori

  Department of Applied Physics, The University of Tokyo

• TAKEMASA Keizo

  Department of Applied Physics, The University of Tokyo

• Yaguchi H

  Division Of Mathematics Electronics And Informatics Graduate School Of Science And Engineering Saita

• Yaguchi Hiroyuki

  Department Of Applied Physics The University Of Tokyo

• Tai Kaori

  Department Of Applied Physics The University Of Tokyo:(present Address)oki Electric Industry Co. Ltd

• Ito R

  Meiji Univ. Kawasaki

• Ito R

  Iwate Univ. Morioka Jpn

• Ito Ryoichi

  Department Of Applied Physics Faculty Of Engineering The University Of Tokyo

• Takemasa Keizo

  Department Of Applied Physics The University Of Tokyo

• Onabe K

  Department Of Advanced Materials Science The University Of Tokyo:department Of Applied Physics The U

• Shiraki Yasuhiro

  Research Center For Advanced Science And Technology (rcast) The University Of Tokyo

• Ito Ryoichi

  Department Of Applied Physics Faculty And Engineering University Of Tokyo

• Onabe Kentaro

  Department of Advanced Materials Science, Graduate School of Frontier Sciences, The University of Tokyo, Kashiwa, Chiba 277-8561, Japan

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