Quantitative Evaluation of Silicon Displacement Induced by Arsenic Implantation Using Silicon Isotope Superlattices

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概要

• 論文の詳細を見る
• Japan Society of Applied Physicsの論文
• 2008-02-25

著者

• ITOH Kohei

  Department of Applied Physics and Physico-Informatics, Keio University

• SAWANO Kentarou

  Research Center for Silicon Nano-Science, Advanced Research Laboratories, Tokyo City University

• SHIRAKI Yasuhiro

  Research Center for Advanced Science and Technology (RCAST), The University of Tokyo

• Itoh Kohei

  Keio Univ. Yokohama Jpn

• Itoh Kohei

  Department Of Applied Physics And Physico-informatics And Crest-jst Keio University

• Sawano Kentarou

  Research Center For Silicon Nano-science Advanced Research Laboratories Musashi Institute Of Technol

• SHIMIZU Yasuo

  Department of Second Internal Medicine, Nagoya University School of Medicine

• Shiraki Yasuhiro

  School Of Fundamental Science And Technology Keio University

• UEMATSU Masashi

  Department of Applied Physics and Physico-Informatics, Keio University

• TAKANO Akio

  NTT Advanced Technology Corporation

• Uematsu Masashi

  School Of Fundamental Science And Technology Keio University

• Shimizu Yasuo

  Department Of Endoscopy And Endoscopic Surgery Gunma University Hospital

• Shiraki Yasuhiro

  Department Of Applied Physics And Physico-informatics Keio University

• Sawano Kentarou

  Tokyo City Univ. Tokyo Jpn

• Shimizu Yasuo

  Department 4 Technology Research Division 2 Honda R&d Co. Ltd. Automobile R&d Center

• Shiraki Yasuhiro

  Research Center For Advanced Science And Technology (rcast) The University Of Tokyo

• Itoh Kohei

  Department of Applied Physics and CREST-JST, Keio University, Yokohama 223-8522, Japan

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