Strain Relaxation and Surface Morphology of Ultrathin High Ge Content SiGe Buffers Grown on Si(001) Substrate
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概要
- 論文の詳細を見る
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2007-02-15
著者
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SHIRAKI Yasuhiro
Research Center for Advanced Science and Technology (RCAST), The University of Tokyo
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Myronov Maksym
Advanced Research Laboratories Musashi Institute Of Technology
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Shiraki Yasuhiro
School Of Fundamental Science And Technology Keio University
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MYRONOV Maksym
Research Center for Silicon Nano-Science, Advanced Research Laboratories, Musashi Institute of Techn
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