Myronov Maksym | Advanced Research Laboratories Musashi Institute Of Technology
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概要
関連著者
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Myronov Maksym
Advanced Research Laboratories Musashi Institute Of Technology
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Shiraki Yasuhiro
School Of Fundamental Science And Technology Keio University
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ITOH Kohei
Department of Applied Physics and Physico-Informatics, Keio University
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Itoh Kohei
Keio Univ. Yokohama Jpn
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Shiraki Yasuhiro
Department Of Applied Physics And Physico-informatics Keio University
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Sawano Kentarou
Tokyo City Univ. Tokyo Jpn
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Itoh Kohei
Department Of Applied Physics And Physico-informatics And Crest-jst Keio University
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SAWANO Kentarou
Advanced Research Laboratories, Musashi Institute of Technology
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Itoh Kohei
Department of Applied Physics and CREST-JST, Keio University, Yokohama 223-8522, Japan
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SHIRAKI Yasuhiro
Department of Applied Physics, The University of Tokyo
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SHIRAKI Yasuhiro
Research Center for Advanced Science and Technology (RCAST), The University of Tokyo
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Myronov Maksym
Musashi Inst. Of Technol. Tokyo Jpn
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Shiraki Y
Research Center For Silicon Nano-science Advanced Research Laboratories Musashi Institute Of Technol
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SHIRAKI Yasuhiro
Advanced Research Laboratories, Musashi Institute of Technology
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SAWANO Kentarou
Musashi Institute of Technology, Advanced Research Laboratories
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SHIRAKI Yasuhiro
Musashi Institute of Technology, Advanced Research Laboratories
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MYRONOV Maksym
Research Center for Silicon Nano-Science, Advanced Research Laboratories, Musashi Institute of Techn
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Shiraki Yasuhiro
Advanced Research Laboratories Musashi Institute Of Technology
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Sawano Kentarou
Research Center For Silicon Nano-science Advanced Research Laboratories Tokyo City University
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Shiraki Yasuhiro
Musashi Institute Of Technology Research Center For Silicon Nano-science
著作論文
- Observation of Pronounced Effect of Compressive Strain on Room-Temperature Transport Properties of Two-Dimensional Hole Gas in a Strained Ge Quantum Well
- Room-temperature Transport Properties of High Drift Mobility Two-dimensional Electron Gas Confined in a Strained Si Quantum Well
- Demonstration of holes in strained Ge quantum wells with much higher drift mobility and density than that of electrons in strained Si channels
- Strain Relaxation and Surface Morphology of Ultrathin High Ge Content SiGe Buffers Grown on Si(001) Substrate