Demonstration of holes in strained Ge quantum wells with much higher drift mobility and density than that of electrons in strained Si channels
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概要
- 論文の詳細を見る
- 2007-09-19
著者
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ITOH Kohei
Department of Applied Physics and Physico-Informatics, Keio University
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Myronov Maksym
Advanced Research Laboratories Musashi Institute Of Technology
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Myronov Maksym
Musashi Inst. Of Technol. Tokyo Jpn
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Itoh Kohei
Keio Univ. Yokohama Jpn
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Shiraki Yasuhiro
School Of Fundamental Science And Technology Keio University
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Shiraki Y
Research Center For Silicon Nano-science Advanced Research Laboratories Musashi Institute Of Technol
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SAWANO Kentarou
Musashi Institute of Technology, Advanced Research Laboratories
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SHIRAKI Yasuhiro
Musashi Institute of Technology, Advanced Research Laboratories
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Shiraki Yasuhiro
Department Of Applied Physics And Physico-informatics Keio University
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Sawano Kentarou
Research Center For Silicon Nano-science Advanced Research Laboratories Tokyo City University
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Sawano Kentarou
Tokyo City Univ. Tokyo Jpn
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Shiraki Yasuhiro
Musashi Institute Of Technology Research Center For Silicon Nano-science
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