Deposition of SiO_2 Films on Strained SiGe Layer by Direct Photo Chemical Vapor Deposition
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概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 1995-01-15
著者
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SHIRAKI Yasuhiro
Research Center for Advanced Science and Technology (RCAST), The University of Tokyo
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CHANG Shoou-Jinn
Department of Electrical Engineering, National Cheng Kung University
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Lin C‐t
Taiwan Semiconductor Manufacturing Co. Hsinchu Twn
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Chang S‐j
Department Of Electrical Engineering National Cheng-kung University
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Chang Shoou-jinn
Department Of Electrical Engineering National Cheng Kung University
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LIN Chung-Te
Department of Electrical Engineering, National Cheng Kung University
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NAYAK Deepok
Research Center for Advanced Science and Technology, University of Tokyo
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Lin Chung-te
Department Of Electrical Engineering National Cheng Kung University
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Nayak Deepok
Research Center For Advanced Science And Technology University Of Tokyo
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Shiraki Yasuhiro
Research Center For Advanced Science And Technology (rcast) The University Of Tokyo
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Shiraki Yasuhiro
Research Center For Advanced Science And Technology University Of Tokyo
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SHIRAKI Yasuhiro
Research Center for Advanced Science and Technology, University of Tokyo
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