Direct Oxidation of Si_<1-x>Ge_x Layers Using Vacuum-Ultra-Violet Light Radiation in Oxygen

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1998-02-01

著者

• Chang Chun

  Department Of Electronics Engineering National Chiao Tung University

• Chang C‐y

  Department Of Electronics Engineering National Chiao Tung University

• Huang Guo-wei

  National Nano Device Laboratories

• Huang Guo‐wei

  National Nano Device Laboratories

• CHANG Chun-Yen

  National Nano Device Laboratories

• Chien C‐h

  Department Of Electronics Engineering And Institute Of Electronics National Chiao Tung University

• Chang Chun-yen

  Institute Of Electronics National Chiao Tung University

• CHANG Shoou-Jinn

  Department of Electrical Engineering, National Cheng Kung University

• CHEN Liang-Po

  National Nano Device Laboratory

• Chen L‐p

  National Nano Device Laboratories

• CHAN Yuen-Chang

  Department of Electrical Engineering, National Cheng Kung University

• HUANG Guo-Wei

  Institute of Electronics, National Chiao Tung University

• Chang Chun‐yen

  Institute Of Electronics National Chiao Tung University

• Chen Liang-po

  National Nano Device Laboratories

• Huang G‐w

  National Nano Device Laboratories

• Chan Yuen-chang

  Department Of Electrical Engineering National Cheng Kung University

• Chang Chun-yen

  Institute Of Electronics National Chiao Tang University:national Nano-device Laboratories

• Chang Shoou-jinn

  Department Of Electrical Engineering National Cheng Kung University

• Chang C‐y

  Department Of Electronics Engineering Nation Chiao Tung University

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