The Effects of Super-Steep-Retrograde Indium Channel Profile on Deep Submicron n-Channel Metal-Oxide-Semiconductor Field-Effect Transistor

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概要

• 論文の詳細を見る
• Publication Office, Japanese Journal of Applied Physics, Faculty of Science, University of Tokyoの論文
• 2001-01-15

著者

• Lin T

  United Microelectronics Corp. Hsinchu Twn

• Huang T‐y

  National Chiao Tung Univ. Hsinchu Twn

• Chang Chun-yen

  Institute Of Electronics National Chiao Tung University

• HUANG Tiao-Yuan

  Institute of Electronics, National Chiao Tung University

• CHANG Sun-Jay

  Institute of Electronics, National Chiao-Tung University

• Lee Yao-jen

  Institute Of Electronics National Chiao Tung University

• Chou J‐w

  United Microelectronics Corp. Technology Development Division

• Chou Jih-wen

  United Microelectronics Corporation Device Engineering Department Specially Technology Division

• Yeh W‐k

  National Univ. Kaohsiung Kaohsiung Twn

• Luo Wen-zheng

  Institute Of Electronics National Chiao Tung University

• Chen Coming

  Institute Of Electronics National Chiao Tung University

• Yeh Wen-kuan

  United Microelectronics Corp. Specialty Technology Department Technogoly & Process Development D

• LIN Tony

  United Microelectronics Corp., technology Development Division

• CHAO Tien-Shen

  National Nano Device Labs

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