Impacts of LP-SiN Capping Layer and Lateral Diffusion of interface Trap on Hot Carrier Stress of NMOSFETs

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概要

• 論文の詳細を見る
• 2006-09-13

著者

• Huang T‐y

  National Chiao Tung Univ. Hsinchu Twn

• Lee Y‐j

  National Chiao Tung Univ. Hsinchu Twn

• LEE Yao-Jen

  National Nano Device Laboratories

• HUANG Tiao-Yuan

  National Nano Device Laboratory

• LIN Horng-Chih

  National Nano Device Labs.

• Huang T-y

  Department Of Electronics Engineering And Institute Of Electronics National Chiao Tung University

• LU Chia-Yu

  National Chiao Tung University

• LU Ching-Sen

  National Chiao Tung University

• HSIEH Yu-Lin

  National Chiao Tung University

• Lee Yao-jen

  Department Of Electronics Engineering And Institute Of Electronics National Chiao Tung University

• Huang Tiao-yuan

  Institute Of Electronics National Chiao Tung University

• Lin Horng-chih

  Department Of Electronics Engineering And Institute Of Electronics National Chiao Tung University

• Lin Horng-chih

  Institute Of Electronics National Chiao Tung University

• Lin Horng-chih

  National Nano Device Lab.

• Huang Tiao-yuan

  Department Of Electronics Engineering And Institute Of Electronics National Chiao Tung University

• Huang Tiao-yuan

  National Chiao Tung University

• Lin Horng-chih

  National Chiao Tung University

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