Low Dielectric Constant Polymer Materials as Bottom Antirefiective Coating Layers for both KrF and ArF Lithography

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 2002-06-30

著者

• Chen H‐c

  Department Of Electronics Engineering And Institute Of Electronics National Chiao Tung University

• Cheng H‐c

  National Tsing Hua Univ. Hsinchu Twn

• Cheng Huang‐chung

  Nano Electronics And Display Technology Lab. Department Of Electronics Engineering And Institute Of

• KO Fu-Hsiang

  National Nano Device Lab.

• HUANG Tiao-Yuan

  National Nano Device Laboratory

• Huang Tiao-yuan

  National Nano Device Lab.

• CHEN Hsuen-Li

  National Nano Device Laboratories

• Chu Tien-chi

  Yuanpei Institute Of Science And Technology

• Ko F‐h

  National Nano Device Lab.

• Chen Hsuen-li

  National Nano Device Lab.

• CHU Tien-Chi

  Department of Nuclear Science, National Tsing Hua University

• CHENG Hsu-Chun

  Department of Nuclear Science, National Tsing Hua University

• Huang Tiao-yuan

  National Chiao Tung University

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