Charging Damages to Gate Oxides in a Helicon O_2 Plasma

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1997-12-15

著者

• Chen H‐c

  Department Of Electronics Engineering And Institute Of Electronics National Chiao Tung University

• Cheng H‐c

  National Tsing Hua Univ. Hsinchu Twn

• Cheng Huang‐chung

  Nano Electronics And Display Technology Lab. Department Of Electronics Engineering And Institute Of

• CHENG Huang-Chung

  Department of Electronics Engineering and Institute of Electronics, National Chiao Tung University

• Dai B‐t

  National Nano Device Lab. Hsinchu Twn

• Dai Bau-tong

  National Nano Device Laboratories

• Dai Bau-tong

  National Nano Device Lab.

• LIN Wendy

  Department of Electronics Engineering and Institute of Electronics, National Chiao Tung University

• KANG Tzong-Kuei

  Department of Electronics Engineering and Institute of Electronics, National Chiao Tung University

• PERNG Yean-Chyi

  Department of Electronics Engineering and Institute of Electronics, National Chiao Tung University

• Lin Wu

  Precision Engineering And Nanotechnology Center School Of Mechanical & Production Engineering Na

• Lin W

  Chartered Semiconductor Manufacturing Ltd. Sgp

• Kang Tzong-kuei

  Department Of Electronics Engineering And Institute Of Electronics National Chiao Tung University

• Cheng Huang-chung

  Department Of Electronics Engineering And Institute Of Electronics National Chiao Tang University

• Perng Yean-chyi

  Department Of Electronics Engineering And Institute Of Electronics National Chiao Tung University

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