Novel Technique to Form Pt-Silicided Shallow p^+n Junctions Using Low-Temperature Processes

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1995-09-01

著者

• CHENG Huang-Chung

  Department of Electronics Engineering and Institute of Electronics, National Chiao Tung University

• LIN Cheng-Tung

  Department of Electronics Engineering and Institute of Electronics, National Chiao Tang University,

• Lin Cheng-tung

  Department Of Electronics Engineering And Institute Of Electronics National Chiao Tung University Na

• Lin Cheng-tung

  Department Of Chemistry Washington University

• Cheng Huang-chung

  Department Of Electronics Engineering And Institute Of Electronics National Chiao Tang University

• Cheng Huang-chung

  Department Of Electronics Engineering And Institute Of Electronics National Chiao Tung University Na

• MA Kuo-Peng

  Department of Electronics Engineering and Institute of Electronics, National Chiao Tung University,

• Ma Kuo-peng

  Department Of Electronics Engineering And Institute Of Electronics National Chiao Tung University Na

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