Effects of O_2- and N_2O-Plasma Treatments on Properties of Plasma-Enhanced-Chemical-Vapor-Deposition Tetraethylorthosilicate Oxide

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1999-07-15

著者

• CHANG Chun-Yen

  Department of Electronics Engineering, National Chiao Tung University

• CHENG Huang-Chung

  Department of Electronics Engineering and Institute of Electronics, National Chiao Tung University

• Chang Chun-yen

  Department Of Electronics Engineering And Institute Of Electronics National Chiao Tung University

• Chang Chun-yen

  Department Of Electronics Engineering & Institute Of Electronics National Chiao Tung Uiversity

• FENG Ming-Shiann

  Department of Materials Science & Engineering, National Chiao-Tung University

• Cheng Huang-chung

  Department Of Electronics Engineering And Institute Of Electronics National Chiao Tang University

• Chen Ying-Chia

  Department of Materials Science and Engineering, National Chiao Tung University

• Yang Ming-Zang

  Department of Electronics Engineering and Institute of Electronics, National Chiao Tung University

• Tung I-Chung

  Department of Materials Science and Engineering, National Chiao Tung University

• Chen Mengpang

  Department of Materials Science and Engineering, National Chiao Tung University

• Tung I-chung

  Department Of Materials Science And Engineering National Chiao Tung University

• Yang Ming-zang

  Department Of Electronics Engineering And Institute Of Electronics National Chiao Tung University

• Chen Ying-chia

  Department Of Materials Science And Engineering National Chiao Tung University

• Chen Mengpang

  Department Of Materials Science And Engineering National Chiao Tung University

• Yang Ming-Zag

  Department of Electronics Engineering and Institute of Electronics, National Chiao Tung University

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