Comparison of N_2 and NH_3 Plasma Passivation Effects on Polycrystalline Silicon Thin-Film Transistors

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概要

• 論文の詳細を見る
• 社団法人応用物理学会の論文
• 1998-07-15

著者

• CHANG Chun-Yen

  Department of Electronics Engineering, National Chiao Tung University

• HUANG Tiao-Yuan

  Department of Electronics Engineering, National Chiao Tung University

• Lee Yeong-shyang

  Department Of Electronics Engineering & Institute Of Electronics National Chiao Tung University

• Huang Tiao-yuan

  Department Of Electronics Engineering & Institute Of Electronics National Chiao Tung University

• Chang Chun-yen

  Department Of Electronics Engineering & Institute Of Electronics National Chiao Tung Uiversity

• LIN Hsiao-Yi

  Department of Electronics Engineering and Institute of Electronics, National Chiao Tung University

• Lei Tan-fu

  Department Of Electronic Engineering National Chiao Tung University

• Lei T‐f

  National Chiao Tung Univ. Hsin‐chu Twn

• Lin Hsiao-yi

  Department Of Electronics Engineering & Institute Of Electronics National Chiao Tung University

• Chang Chun-yen

  Department Of Electronics Engineering & Institute Of Electronics National Chiao Tung University

• CHANG T.

  National Nano Device Laboratories

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